Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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YOKOYAMA Shin
Research Center for Nanodevices and Systems, Hiroshima University
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KAWAKAMI Nobuyuki
Electronics Research Laboratory, Kobe Steel, Ltd.
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SHIBAHARA Kentaro
Research Center for Nanodevices and Systems, Hiroshima University
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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Shibahara K
Research Center For Nanodevices And Systems Hiroshima University
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Aoki Y
The Reserch Center For Nanodevices And Systems Hiroshima University
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AOKI Yasuyuki
Research Center for Nanodevices and Systems, Hiroshima University
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KUGIMIYA Toshihiro
Electronics and Information Technology Laboratory, Kobe Steel Ltd.
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Kugimiya Toshihiro
Electronics And Information Technology Laboratory Kobe Steel Ltd.
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Kawakami Nobuyuki
The Electronics Research Laboratory Kobe Steel Corporation
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Kawakami Nobuyuki
Electronics Research Laboratory Kobe Steel Ltd.
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Shibahara K
Hiroshima Univ. Higashihiroshima‐shi Jpn
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Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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