Kawakami Nobuyuki | The Electronics Research Laboratory Kobe Steel Corporation

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概要

• KAWAKAMI Nobuyukiの詳細を見る
• 同名の論文著者
• The Electronics Research Laboratory Kobe Steel Corporationの論文著者

関連著者

• Shibahara K

  Research Center For Nanodevices And Systems Hiroshima University

• Aoki Y

  The Reserch Center For Nanodevices And Systems Hiroshima University

• Kawakami Nobuyuki

  The Electronics Research Laboratory Kobe Steel Corporation

• Shibahara K

  Hiroshima Univ. Higashihiroshima‐shi Jpn

• YOKOYAMA Shin

  Research Center for Nanodevices and Systems, Hiroshima University

• KAWAKAMI Nobuyuki

  Electronics Research Laboratory, Kobe Steel, Ltd.

• SHIBAHARA Kentaro

  Research Center for Nanodevices and Systems, Hiroshima University

• SHIBAHARA Kentaro

  the Research Center for Nanodevices and Systems, Hiroshima University

• Yokoyama Shin

  Research Center For Integrated Systems Hiroshima University

• NOTSU Daisuke

  The Reserch Center for Nanodevices and Systems, Hiroshima University

• IKECHI Naoya

  The Reserch Center for Nanodevices and Systems, Hiroshima University

• AOKI Yasuyuki

  The Reserch Center for Nanodevices and Systems, Hiroshima University

• KAWAKAMI Nobuyuki

  The Electronics Research Laboratory, Kobe Steel Corporation

• AOKI Yasuyuki

  Research Center for Nanodevices and Systems, Hiroshima University

• KUGIMIYA Toshihiro

  Electronics and Information Technology Laboratory, Kobe Steel Ltd.

• Ikechi Naoya

  The Reserch Center For Nanodevices And Systems Hiroshima University

• Notsu Daisuke

  The Reserch Center For Nanodevices And Systems Hiroshima University

• Kugimiya Toshihiro

  Electronics And Information Technology Laboratory Kobe Steel Ltd.

• Kawakami Nobuyuki

  Electronics Research Laboratory Kobe Steel Ltd.

• Shibahara Kentaro

  Research Center For Nanodevices And Systems Hiroshima University

• Shibahara Kentaro

  Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan

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著作論文

• Fabrication of 100 nm Width Fine Active-Region Using LOCOS Isolation(Special Issue on Advanced Sub-0.1μm CMOS Devices)
• Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process

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