Focused Ion Beam Lithography Using Ladder Silicone Spin-on Glass as a Positive Resist
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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KAWAKAMI Nobuyuki
Electronics Research Laboratory, Kobe Steel, Ltd.
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SUZUKI Kohei
Electronics Research Laboratory, Kobe Steel, Ltd.
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YAMASHITA Motoji
Electronics Research Laboratory, Kobe Steel, Ltd.
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NAKAUE Akimitsu
Electronics Research Laboratory, Kobe Steel, Ltd.
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Nakaue A
Electronics Research Laboratory Kobe Steel Ltd.
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Nakaue Akimitsu
Electronics Research Laboratory Kobe Steel Ltd.
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Suzuki K
Kobe Steel Ltd. Hyogo Jpn
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Kawakami Nobuyuki
Electronics Research Laboratory Kobe Steel Ltd.
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Suzuki Kohei
Electronics Research Laboratory Kobe Steel Ltd.
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- Focused Ion Beam Lithography Using Ladder Silicone Spin-on Glass as a Positive Resist
- Focused Ion Beam Lithography Using Ladder Silicone Spin-On Glass
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