Sano Yoshiaki | Research And Development Group Oki Electric Industry Co. Lid.
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概要
関連著者
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Sano Yoshiaki
Research And Development Group Oki Electric Industry Co. Lid.
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Sano Y
Division Of Precision Science And Technology And Applied Physics Graduate School Of Engineering Osak
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KAMINISHI Katsuzo
Research Laboratory, Oki Electric Industry Co., Ltd.
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Kaminishi Katsuzo
Research Laboratory Oki Electric Industry Co. Ltd.
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Kaminishi K
Miyazaki Univ. Miyazaki‐shi Jpn
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NAKAMURA Hiroshi
Research Center for Advanced Science and Technology, the University of Tokyo
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EGAWA Takashi
Research center for Nano-Device and System, Nagoya Institute of Technology
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Egawa Takashi
Research Center For Nano-device And System Nagoya Institute Of Technology
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Egawa Takashi
Research Laboratory Oki Electric Industry Co. Ltd.
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Ishida Toshimasa
Research Laboratory Oki Electric Industry Co. Lid
著作論文
- Sub-Quarter-Micron Gate Fabrication Process Using Phase-Shifting Mask for Microwave GaAs Devices
- Influence of Annealing Method on Microscopic One-to-One Correlation between Threshold Voltage of GaAs MESFET and Dislocation
- The Dependence of Threshold Voltage Scattering of GaAs MESFET on Annealing Method
- A New Insulated-Gate Inverted-Structure Modulation-Doped AlGaAs/GaAs/N-AlGaAs Field-Effect Transistor
- Improved Threshold Voltage Uniformity in GaAs MESFET Using High Purity MOCVD-Grown Buffer Layer as a Substrate for Ion Implantation