Ikari A | R&d Group Wacker Nsce Corporation
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概要
関連著者
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Ikari A
Wacker Nsce Corp. Yamaguchi Jpn
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Ikari Atsushi
Kimura Metamelt Project Erato Jrdc:(present Address) Advanced Technology Research Laboratories Nippo
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Ikari Atsushi
R&d Group Wacker Nsce Corporation
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Ikari A
R&d Group Wacker Nsce Corporation
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UEDONO Akira
Institute of Materials Science, University of Tsukuba
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Uedono A
Univ. Tsukuba Tsukuba Jpn
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Uedono Akira
Institute Of Applied Physics University Of Tsukuba
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TERASHIMA Kazutaka
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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KIMURA Shigeyuki
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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IKARI Atsushi
Kimura Metamelt Project, ERATO, JRDC
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IKARI Atsushi
Electronics R & D Laboratories, Nippon Steel Corporation
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Tanaka Masahiro
R&d Group Wacker Nsce Corporation
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Kimura S
Ntt Photonics Lab. Kanagawa Jpn
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Kitahara Koichi
R&d Group Wacker Nsce Corporation
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HAGA Hiroyo
Electronics Research Laboratories, Nippon Steel Corporation
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Nakai Katsuhiko
R&d Group Wacker Nsce Corporation
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Haga Hiroyo
Electronics Research Laboratories Nippon Steel Corporation
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Ohta Yasumitsu
R&d Group Wacker Nsce Corporation
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TERASHIMA Kazutaka
湘南工科大学工学部材料工学科
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KIMURA Shigeyuki
木村融液動態プロジェクト
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NAKAI Katsuhiko
R&D Group, Wacker NSCE Corporation
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KITAHARA Koichi
R&D Group, Wacker NSCE Corporation
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OHTA Yasumitsu
R&D Group, Wacker NSCE Corporation
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IKARI Atsushi
R&D Group, Wacker NSCE Corporation
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TANAKA Masahiro
R&D Group, Wacker NSCE Corporation
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Kitahara K
R&d Group Wacker Nsce Corporation
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Kimura Shigeyuki
Kimura Metamelt Project
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Terashima Kazutaka
Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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TANIGAWA Shoichiro
Institute of Materials Science, The University of Tsukuba
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Sasaki H
Univ. Tsukuba Ibaraki Jpn
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WEI Long
Institute of Materials Science, University of Tsukuba
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SASAKI Hitoshi
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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Kitano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
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Wei L
Institute Of Materials Science University Of Tsukuba
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Wei Long
Institute Of Materials Science University Of Tsukuba
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KAWAKAMI Kazuto
Advanced Technology Research Laboratories, Nippon Steel Corporation
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Kimura Shingo
Department Of Physics School Of General Education Iwate Medical University
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Kawano T
Osaka Univ. Osaka Jpn
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Yoda Osamu
Takasaki Radiation Chemistry Research Establishment Japan Atomic Energy Research Institute
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Kawano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
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Sasaki Hajime
Semiconductor Group Mitsubishi Electric Corporation
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KAWAKAMI Kazuto
Electronics R & D Laboratories, Nippon Steel Corporation
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Kitano T
Fundamental Research Laboratories Nec Corporation
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Sasaki Hideyuki
R&d Center Toshiba Corp.
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Tanigawa Shoichiro
Institute Of Applied Physics University Of Tsukuba
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Sasaki Hitoshi
Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium
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Sasaki H
Semiconductor Group Mitsubishi Electric Corporation
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Sasaki H
Electrotechnical Laboratory
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KAWANO Takao
Isotope Center, University of Tsukuba
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UJIHIRA Yusuke
Research Center for Advanced Science and Technology, University of Tokyo
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Ujihira Y
Research Center For Advanced Science And Technology University Of Tokyo
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Ujihira Yusuke
Faculty Of Engineering Tokyo University
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Ujihira Yusuke
Research Center For Advanced Science And Technology The University Of Tokyo
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Tanigawa S
Institute Of Applied Physics University Of Tsukuba
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MATSUO Syuitsu
Toshiba Ceramics Co., Ltd.
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Matsuo Syuitsu
Toshiba Ceramics Co. Ltd.
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Terashima K
Nec Corp. Kanagawa Jpn
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Kawakami K
Nippon Steel Corp. Kanagawa Jpn
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Kawakami Kazuto
Electronics Research Laboratories Nippon Steel Corporation
著作論文
- Temperature Dependence of the Electrical Resistivity of Molten Silicon
- Defects in Czochralski-Grown Silicon Crystals Investigated by Positron Annihilation
- Crystal Defects in Epitaxial Layer on Nitrogen-doped Czochralski-grown Silicon Substrate (II) : Suppression of the Crystal Defects in Epitaxial Layer by the Control of Crystal Growth Condition and Carbon Co-doping
- Crystal Defects in Epitaxial Layer on Nitrogen-doped Czochralski-grown Silicon Substrate (I) : Investigation of the Crystallographic Structure
- In Situ Observation of Etching Processes of Silica Glasses by Silicon Melts
- Oxygen Clusters in Quenched Czochralski-Si Studied by Infrared Spectroscopy and Positron Annihilation