Terashima K | Nec Corp. Kanagawa Jpn

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概要

• 同名の論文著者
• Nec Corp. Kanagawa Jpnの論文著者

関連著者

• Terashima K

  Nec Corp. Kanagawa Jpn

• TERASHIMA Kazutaka

  Optoelectronics Joint Research Laboratory

• Fukuda Tsuguo

  Optoelectronics Joint Research Laboratory

• Katsumata T

  Department Of Applied Chemistry Toyo University

• ORITO Fumio

  Optoelectronics Joint Research Laboratory

• TERASHIMA Kazutaka

  Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium

• Tajima M

  Inst. Space And Astronautical Sci. Sagamihara Jpn

• Tajima Michio

  Optoelectronics Joint Research Laboratory

• Tajima Michio

  Institute Of Space And Astronautical Scienc

• Ishida Koichi

  Optoelectronics Joint Research Laboratory:(present Address) Fundamental Research Laboratories Nec Co

• Ishida Koichi

  Optoelectronics Joint Research Laboratory

• NAKAJIMA Masato

  Optoelectronics Joint Research Laboratory

• Nakajima M

  Optoelectronics Joint Research Laboratory

• Nakajima M

  Toshiba Corp. Kawasaki

• Nakajima M

  Mitsubishi Electric Corp. Amagasaki

• Emori Haruo

  Optoelectronics Joint Research Laboratory

• Matsumura T

  Department Of Electronic Engineering Faculty Of Engineering Gunma University

• MATSUMURA Takao

  Optoelectronics Joint Research Laboratory

• KATSUMATA Tooru

  Optoelectronics Joint-Research Laboratory

• Miyoshi K

  Ulsi Device Development Laboratory Nec Corporation

• TERASHIMA Koichi

  ULSI Device Development Laboratory, NEC Corporation

• MIYOSHI Kousuke

  ULSI Device Development Laboratory, NEC Corporation

• Terashima Kazutaka

  Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium

• Tajima Michio

  Department Of Electronic Engineering Faculty Of Engineering University Of Tokyo:(present Address) El

• 石田 謙司

  神戸大学 大学院工学研究科

• Terashima Koichi

  Ulsi Device Development Laboratory Nec Corporation

• KATSUMATA Tooru

  Optoelectronics Joint Research Laboratory

• UEDONO Akira

  Department of Industrial Chemistry, The University of Tokyo

• TANIGAWA Shoichiro

  Institute of Materials Science, The University of Tsukuba

• Uedono A

  Univ. Tsukuba Tsukuba Jpn

• KIMURA Shigeyuki

  Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium

• IKARI Atsushi

  Kimura Metamelt Project, ERATO, JRDC

• TOKIZAKI Eiji

  Kimura Metamelt Project, ERATO, JRDC

• Ikari A

  Wacker Nsce Corp. Yamaguchi Jpn

• Ikari Atsushi

  Kimura Metamelt Project Erato Jrdc:(present Address) Advanced Technology Research Laboratories Nippo

• Ikari Atsushi

  R&d Group Wacker Nsce Corporation

• Kimura Shingo

  Department Of Physics School Of General Education Iwate Medical University

• Kimura S

  Ntt Photonics Lab. Kanagawa Jpn

• Tanigawa Shoichiro

  Institute Of Applied Physics University Of Tsukuba

• Uedono Akira

  Department Of Industrial Chemistry Faculty Of Engineering University Of Tokyo

• OBOKATA Takeshi

  Optoelectronics Joint Research Laboratory

• Ikari A

  R&d Group Wacker Nsce Corporation

• KIKUTA Toshio

  Optoelectronics Joint Research Laboratory

• Sato Takashi

  Optoelectronics Joint Research Laboratory

• Ozawa Shoichi

  Optoelectronics Joint Research Laboratory

• KATSUMATA Tohru

  Optoelectronics Joint Research Laboratory

• TERASHIMA Kazutaka

  湘南工科大学工学部材料工学科

• KIMURA Shigeyuki

  木村融液動態プロジェクト

• Tokizaki Eiji

  Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium

• MATSUO Syuitsu

  Toshiba Ceramics Co., Ltd.

• Matsuo Syuitsu

  Toshiba Ceramics Co. Ltd.

• Kimura Shigeyuki

  Kimura Metamelt Project

• OBOKATA Takeshi

  Optoelectronics Joint-Research Laboratory

もっと見る 閉じる

著作論文

• Study of Point Defects in Bulk ZnSe Grown by Nonstoichiometric Annealing
• Effect of Melt Stoichiometry on Electrical Activation Uniformity of Si-Implanted Layers in Undoped Semi-Insulating GaAs
• Striations in Undoped Semi-Insulating LEC GaAs
• Improved Uniformity of Resistivity Distribution in LEC Semi-Insulating GaAs Produced by Annealing
• Resistivity, Hall Mobility and Leakage Current Variations in Undoped Semi-Insulating GaAs Crystal Grown by LEC Method
• In Situ Observation of Etching Processes of Silica Glasses by Silicon Melts
• Effect of Magnetic Field on Residual Impurity Concentration in LEC GaAs Single Crystal
• Vertical Magnetic Field Applied LEC Apparatus for Large Diameter GaAs Single Crystal Growth
• Photoluminescence of Low-Energy B^+-Implanted Silicon under Ultraviolet Light Excitation
• Photoluminescence of Low-Energy B± Implanted Silicon under Ultraviolet Light Excitation

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