Kubota M | Opto-electronics Laboratories Oki Electric Industry Co. Ltd.

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著作論文

CLONING OF BMP HOMOLOGUE FROM DICYEMID MESOZOANS(Taxonomy and Systematics,Abstracts of papers presented at the 76^ Annual Meeting of the Zoological Society of Japan)
Phylogenetic Relationships among Major Species of Japanese Coleoid Cephalopods(Mollusca: Cephalopoda) Using Three Mitochondrial DNA Sequences(Animal Diversity and Evolution)
PHYLOGENETIC ANALYSIS OF THE JAPANESE CEPHALOPODS BASED ON PARTIALMITOCHONDRIAL GENE SEQUENCES(Taxonomy and Systematics,Abstracts of papers presented at the 75^ Annual Meeting of the Zoological Society of Japan)
PHYLOGENETIC ANALYSIS OF THE JAPANESE CEPALOPODS BASED ON MITOCHONDRIAL 16S rDNA GENE SEQUENCES(Taxonomy and Systematics,Abstracts of papers presented at the 74^ Annual Meeting of the Zoological Society of Japan)
Novel Surface Reaction Model in Dry-Etching Process Simulator
Contact Hole Etch Scaling toward 0.1 μm
Spatial and Temporal Behavior of Radicals in Inductively Coupled Plasm for SiO_2 Etching
Plasma-Induced Transconductance Degradation of nMOSFET with Thin Gate Oxide
Quantitative Evaluation of Gate Oxide Damage during Plasma Processing Using Antenna-Structure Capacitors
Thermal Properties of 1.3 μm AlGaInAs Multi Quantum Well Ridge Waveguide Lasers
Thermal Resistance of 1.3μm AlGaInAs/InP MQW Ridge Lasers
Low Threshold 1.3-μm AlGaInAs Buried-Heterostructure Lasers
High Temperature Operation of AlGaInAs Ridge Waveguide Lasers with a p-AlInAs Electron Stopper Layer
Highly Selective SiO2 Etching Using Inductively Coupled Plasma Source with a Multispiral Coil
Electron Beam Induced Damage of MOS Gate Oxide
Electron Beam Induced Damage of MOS Gate Oxide
Radical Behavior in Inductively Coupled Fluorocarbon Plasma for SiO2 Etching
RIE-Lag Reduction by NH_3 Addition in Aluminum Alloy Etching under BCl_3/Cl_2 Chemistry
Lissajous Electron Plasma (LEP) Generation for Dry Etching

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