Arai M | Microsystem Research Center P&i Laboratories Tokyo Institute Of Technology
スポンサーリンク
概要
関連著者
-
Arai M
Microsystem Research Center P&i Laboratories Tokyo Institute Of Technology
-
Koyama Fumio
Research Laboratory Of Precision Machinery And Electronics Tokyo Institute Of Technology
-
Murakami A
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Azuchi Munechika
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Matsutani A
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
-
Iga Kenichi
Precision & Intelligence Lab., Tokyo Institute of Technology
-
Koyama Fumio
Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
Koyama Fumio
Microsystem Research Center, P&I Lab., Tokyo Institute of Technology
-
Matsutani Akihiro
Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
Matsutani Akihiro
Tokyo Inst. Technol. Yokohama Jpn
-
Koyama Fumio
Microsystem Research Center P&i Lab. Tokyo Institute Of Technology
-
Nishiyama N
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Iga K
Microsystem Research Center P & I Lab . Tokyo Institute Of Technology
-
Miyamoto Takanori
Ntt Interdisciplinary Research Laboratories
-
MATSUTANI Akihiro
Microsystem Research Center, P&I Laboratory, Tokyo Institute of Technology
-
MATSUTANI Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Iga K
Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Inoue K
Technol. Res. Inst. Osaka Prefecture Osaka Jpn
-
Arai Masakazu
Microsystem Research Center P&i Laboratory Tokyo Institute Of Technology
-
Miura Toru
Microsystem Research Center P&i Laboratory Tokyo Institute Of Technology
-
Matsutani Akihiro
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
NISHIYAMA Nobuhiko
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Koyama Fumio
Microsystem Research Center, P & I Lab., Tokyo Institute of Technology
-
KOYAMA Fumio
Microsystem Research Center, Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
MIYAMOTO Tomoyuki
Microsystem Research Center, Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
OHTSUKI Hideo
Samco International Inc.
-
IGA Kenichi
Microsystem Research Center, Tokyo Institute of Technology
-
Iga Kenichi
Microsystem Research Center P & I Lab . Tokyo Institute Of Technology
-
Miyamoto T
Tokyo Inst. Technol. Tokyo Jpn
-
Shinada S
National Institute Of Information And Communications Technology
-
Hatori Nobuaki
Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
MIZUTANI Akimasa
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Miyamoto Tomoyuki
Microsystem Research Center P&i Lab. Tokyo Institute Of Technology
-
Miyamoto T
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
Miyamoto Tomoyuki
Microsystem Research Center P&i Laboratory Tokyo Institute Of Technology
-
ARAI Masakazu
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
NISHIYAMA Nobuhiko
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
-
AZUCHI Munechika
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
OHNOKI Noriyuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Ohnoki Noriyuki
Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
Ohtake N
Niigata Univ. Niigata Jpn
-
AMANO Takeru
Microsystem Research Center, Precision and Interlligence Laboratory, Tokyo Institute of Technology
-
SHINADA Satoshi
Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
KONDO Takashi
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
Mukaihara Toshikazu
Precision & Intelligence Lab., Tokyo Institute of Technology
-
Ohtsuki Hideyo
Samco International Inc.
-
近藤 隆
富山医科薬科大学医学部放射線基礎医学教室
-
近藤 隆
富山医科薬科大学生命科学実験センター
-
Miura T
Microsystem Research Center P&i Laboratory Tokyo Institute Of Technology
-
Kato Junichi
Ntt Lsi Laboratories
-
Kato Junichi
Ntt System Electronics Laboratories
-
Kato J
Ntt Telecommunications Energy Lab. Kanagawa Jpn
-
Kato J
Ntt Lsi Laboratories
-
Kondo T
Osaka Univ. Osaka Jpn
-
Kondo Tetsuya
Storage Technologies Research Center Victor Company Of Japan Limited
-
Kondo Takahiro
Institute Of Applied Physics University Of Tsukuba
-
MIURA Toru
Microsystem Research Center, P&I Laboratory, Tokyo Institute of Technology
-
近藤 隆
富山大学 医学部 放射線基礎医学
-
UCHIDA Takeshi
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
Uchida Takeshi
Department Of Mechanical Engineering Kitakyushu National College Of Technology
-
JANTO Wiganes
Microsystem Research Center, Precision and Interlligence Laboratory, Tokyo Institute of Technology
-
Amano T
Microsystem Research Center P&i Laboratories Tokyo Institute Of Technology
-
SHINADA Satoshi
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
Uchida Takeshi
Microsystem Research Center, P&I Lab., Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
-
Kondo Takashi
Microsystem Research Center, P&I Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
-
Takeuchi K
Riken (the Institute Of Physical And Chemical Research)
-
Kondo T
Technology Development Division Victor Company Of Japan Ltd. (jvc)
-
Koyama Fumio
Tokyo Institute Of Technology 4259 Nagatsuta
-
MITSUGI Satoshi
NTT Basic Research Laboratories, NTT Corp.
-
KAGEYAMA Takeo
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
MAKINO Shigeki
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
IKENAGA Yoshihiko
Microsystem Research Ceterk, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
Mitsugi Satoshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
IGA Kenichi
Tokyo Institute of Technology, Nagatsuta Campus, Research Laboratory of Precision Machinery and Elec
-
MATSUTANI Akihiro
Tokyo Institute of Technology, Precision and Intelligence Laboratory
-
BABA Toshihiko
Division of Electrical and Computer Engineering, Yokohama National University
-
Baba T
Fundamental Research Laboratories Nec Corporation:(present Office)silicon System Laboratories Nec Co
-
Iga Kenichi
Tokyo Institute Of Technology
-
Inaba Yusaku
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
-
Makino Shigeki
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Baba T
Yokohama National Univ. Yokohama‐shi Jpn
-
Kageyama Takeo
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Mitsugi S
Ntt Basic Research Laboratories Ntt Corp.
-
Kusaka Takashi
Department Of Pediatrics Faculty Of Medicine Kagawa University
-
Ikenaga Yoshihiko
Microsystem Research Ceterk Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Inaba Y
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
-
Koyama Fumio
Tokyo Inst. Technol. Yokohama Jpn
-
OHTAKE Nobuyuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Amano Takeru
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
藤田 雅之
レーザー技術総合研究所
-
OHASHI Ken
Shin-Etsu Chemical Co., Ltd.
-
Koyama Fumio
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
Eriguchi K
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
-
Eriguchi Koji
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
Eriguchi Koji
Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.
-
AOKI Yasuhiko
Microsystem Research Center, Tokyo Institute of Technology
-
UCHIYAMA Yasuhiro
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
TAKEDA Kazutaka
Microsystem Research Center, Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
-
Kato Junnichi
Precision & Intelligence Lab., Tokyo Institute of Technology
-
MITSUGI Satoshi
Tokyo Institute of Technology, Precision and Intelligence Laboratory
-
KATO Junichi
Tokyo Institute of Technology, Precision and Intelligence Laboratory
-
MUKAIHARA Toshikazu
Tokyo Institute of Technology, Precision and Intelligence Laboratory
-
Abe M
Mitsui Chemicals Inc. Tokyo Jpn
-
ABE Makoto
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Yamakage Hirokazu
Shin-etsu Chemical Co. Ltd.
-
KATO Junichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology
-
Fujita Masayuki
Yokohama National University Department Of Electrical And Computer Engineering
-
SAKAI Atsushi
Yokohama National University, Department of Electrical and Computer Engineering
-
BABA Toshihiko
Yokohama National University, Department of Electrical and Computer Engineering
-
FUJITA Masayuki
Faculty of Electrical and Computer Engineering, Yokohama National University
-
USHIGOME Reona
Faculty of Electrical and Computer Engineering, Yokohama National University
-
BABA Toshihiko
Faculty of Electrical and Computer Engineering, Yokohama National University
-
MIURA Toshinori
Murata Mfg. Co., Ltd.
-
GOTO Kenya
Department of Information and Communication Technology Tokai University
-
Goto K
Department Of Information And Communication Technology Tokai University
-
Hino Tomoyuki
Microsystem Research Center P&i Laboratories Tokyo Institute Of Technology
-
Kubota M
Opto-electronics Laboratories Oki Electric Industry Co. Ltd.
-
Aoki Yasuhiko
Microsystem Research Center Tokyo Institute Of Technology
-
Ushigome Reona
Yokohama National University Department Of Electrical And Computer Engineering
-
ARIGA Maiko
Yokohama Research and Development Laboratories, Furukawa Electric Co.Ltd.
-
Ariga M
Yokohama National University Division Of Electrical And Computer Engineering
-
Janto Wiganes
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
-
GOTO Kenya
Tokai University
-
Miura T
Murata Mfg. Co. Ltd.
-
YOKOYAMA Tomonori
Shin-Etsu Chemical Co., Ltd.
-
KUBOTA Masafumi
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
-
Arai Masatoshi
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
-
Uraoka Yukiharu
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
-
SEKIDO Yushi
Yokohama National University, Division of Electrical and Computer Engineering
-
Sekido Yushi
Yokohama National University Division Of Electrical And Computer Engineering
-
Ariga Maiko
Yokohama National University Division Of Electrical And Computer Engineering
-
Uchiyama Yasuhiro
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Iga Kenichi
Research Laboratory Of Precision Machinery And Electronics
-
Kubota Masafumi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
AMANO Takeru
Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
FURUKAWA Noriyoshi
Precision & Intelligence Laboratory, Tokyo Institute of Technology
-
MATSUTANI Akihiro
Research Laboratory of Precision Machinery and Electronics, Tokyo Institute of Technology
-
Takeda Kazutaka
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Baba Toshihiko
Faculty Of Electrical And Computer Engineering Yokohama National University
-
Baba Toshihiko
Yokohama National University
-
Fujita Masayuki
Faculty Of Electrical And Computer Engineering Yokohama National University
-
Uraoka Y
Nara Inst. Of Sci. And Technol. Nara Jpn
-
Uraoka Yukiharu
Graduate School Of Materials Science Nara Institute Of Science And Technology
-
Uraoka Yukiharu
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
Sakai Atsushi
Yokohama National University Division Of Electrical And Computer Engineering
-
Furukawa Noriyoshi
Precision & Intelligence Laboratory Tokyo Institute Of Technology
-
Koyama Fumio
Photonics Integration System Research Center Tokyo Institute Of Technology
著作論文
- Reactive ion etching of Si using Ar/F2 plasma (Special issue: Microprocesses and nanotechnology)
- Three-Dimensional Hollow Optical Waveguide with an Etched Groove Substrate
- Modeling and Fabrication of Hollow Optical Waveguide for Photonic Integrated Circuits
- Hollow Optical Waveguide for Temperature-Insensitive Photonic Integrated Circuits : Optics and Quantum Electronics
- 1.2μm Band GaInAs/GaAs High-Density Multiple-Wavelength Vertical Cavity Surface Emitting Laser Array
- Effect of Annealing on Highly Strained GaInAs/GaAs Quantum Wells : Semiconductors
- Low Threshold Current Density Operation of 1.16μm Highly Strained GaInAs/GaAs Vertical Cavity Surface Emitting Lasers on (100) GaAs Substrate : Optics and Quantum Electronics
- 1.4μm GaInNAs/GaAs Quantum Well Laser Grown by Chemical Beam Epitaxy : Short Note
- GaInAs/GaAs Micro-Arc Ring Semiconductor Laser
- Design and Lasing Operation of Micro-Arc-Ring Lasers
- Characterization of Residual Stress in Active Region due to AlAs Native Oxide of Vertical-Cavity Surface-Emitting Lasers
- InGaAs/GaAs Strained Quantum Well Lasers with Etched Micro-Corner Reflectors
- GaInAsP Microcylinder (Microdisk) Injection Laser With AlInAs (O_x) Claddings : Optics and quantum Electronics
- Design and Fabrication of Double-Cavity Tunable Filter Using Micromachined Structure
- Fabrication of Micro-Aperture Surface Emitting Laser for Near Field Optical Data Storage
- Smooth and vertical profile dry etching of Si using XeF2 plasma (Special issue: Microprocesses and nanotechnology)
- Generation of solid-source H2O plasma and its application to dry etching of CaF2 (Special issue: Microprocesses and nanotechnology)
- Wavelength Tuning of Double-Cavity Micromachined Filter with Electrical and Thermal Actuations
- Solid Source Dry Etching Process for GaAs and InP
- Design, Fabrication, and Characterization of Tunable Micromachined Filter with Double-Cavity Structure
- Iodine Solid Source Inductively Coupled Plasma Etching of InP
- Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet
- Size Reduction of Tunable Micromachined Filters for Fast Wavelength Tuning
- Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl_2
- Micromachined GaAs/AlGaAs Resonant-Cavity Light Emitter with Small Temperature Dependence of Emission Wavelength
- Cl_2-based Inductively Coupled Plasma Etching of InP Using Internal Antenna
- Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP
- Single High-Order Transverse Mode Surface Emitting Laser with Micromachined Surface Relief(Special Issue on Recent Progress of Integrated Photonic Devices)
- Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl_2 Inductively Coupled Plasma
- Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl_2/Xe
- Vertical and Smooth Etching of InP by Cl_2/Xe Inductively Coupled Plasma
- Monolothic Formation of Metal Organic Chemical Vapor Deposition Grown Multi-wavelength Vertical Cavities with Highly Strained GaInAs/GaAs Quantum Wells on GaAs (311)B
- Plasma-Induced Transconductance Degradation of nMOSFET with Thin Gate Oxide
- Low Threshold GaInAsP Lasers with Semiconductor/Air Distributed Bragg Reflector Fabricated by Inductively Coupled Plasma Etching
- Heavily p-Type Doped AlAs Growth on GaAs (311)B Substrate Using Carbon Auto-Doping for Low Resistance GaAs/AlAs Distributed Bragg Reflectors
- GaInAs/AlGaInAs Semiconductor Lasers on InP Substrate with AlAs Oxide Current Confinement
- Composition Dependence of Thermal Annealing Effect on 1.3 μm GaInNAs/GaAs Quantum Well Lasers Grown by Chemical Beam Epitaxy : Semiconductors
- Inductively coupled plasma etching of silicon using solid iodine as an etching gas source (Special issue: Microprocesses and nanotechnology)
- 1.12μm PolariZation Controlled Highly Strained GalnAs Vertical-Cavity Surface-Emitting Lasers on GaAs(311)B by Metal Organic Chemical Vapor Deposition : Optics and Quantum Electronics
- Temperature Insensitive Micromachined GaAlAs/GaAs Vertical Cavity Wavelength Filter (Joint Special Issue on Recent Progress in Optoelectronics and Communications)
- Temperature Insensitive Micromachined GaAlAs/GaAs Vertical Cavity Wavelength Filter (Joint Special Issue on Recent Progress in Optoelectronics and Communications)
- GaInAs/GaAs Single Mode Vertical Cavity Surface Emitting Laser (VCSEL) Array on GaAs (311) B(Special Issue on Optical Interconnects/Optical Signal Processing)
- 1.15 μm Lasing Operation of Highly Strained GaInAs/GaAs on GaAs (311)B Substrate with High Characteristic Temperature (T_0 = 210 K)
- P-type AlAs Growth on a GaAs (311)B Substrate Using Carbon Auto-Doping for Low Resistance GaAs/AlAs Distributed Bragg Reflectors
- GaInAs/AlGaInAs Semiconductor Lasers with AlAs Oxide Current Confinement Structure
- Micromachined Semiconductor Vertical Cavity for Temperature Insensitive Surface Emitting Lasers and Optical Filters
- Characterization of Sidewall Damage Induced by Reactive Ion-Beam Etching
- Reactive Ion Beam Etch of GaInAsP/InP Multilayer and Removal of Damaged Layer by Two-Step Etch
- Microfabrication of Dielectric Multilayer Reflector by Reactive Ion Etching and Characterization of Induced Wafer Damage
- Highly Stable Single Polarization Operation of GaInAs/GaAs Vertical-Cavity Surface-Emitting Laser on GaAs(311)B Substrate under High-Speed Modulation
- Vertical-Cavity Surface-Emitting Laser Array on GaAs(311)B Substrate Exhibiting Single-Transverse Mode and Stable-Polarization Operation
- AlAs Oxidation System with H_2O Vaporizer for Oxide-Confined Surface Emitting Lasers
- A Completely Single-Mode and Single-Polarization Vertical-Cavity Surface Emitting Lasers Grown on GaAs (311)B Substrate
- InGaAs/GaAs Vertical-Cavity Surface Emitting Laser on GaAs (311)B Substrate Using Carbon Auto-Doping
- Low Bias Voltage Dry Etching of InP by Inductively Coupled Plasma Using SiCl_4/Ar
- C_ Resist Mask of Electron Beam Lithography for Chlorine-Based Reactive Ion Beam Etching
- Surface Temperature Increase in Reactive Ion Beam Etch and Improvement of Profiles by Multistep Etching
- Measurement of Sidewall Roughness of InP Etched by Reactive Ion Bearn Etching