Ohtsuki Hideo | Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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概要
- Ohtsuki Hideoの詳細を見る
- 同名の論文著者
- Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japanの論文著者
関連著者
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Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
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Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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Matsutani Akihiro
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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OHTSUKI Hideo
Samco International Inc.
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Koyama Fumio
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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MATSUTANI Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Koyama Fumio
Research Laboratory Of Precision Machinery And Electronics Tokyo Institute Of Technology
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Arai M
Microsystem Research Center P&i Laboratories Tokyo Institute Of Technology
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Iga Kenichi
Precision & Intelligence Lab., Tokyo Institute of Technology
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Azuchi Munechika
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Murakami A
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Ohtsuki Hideyo
Samco International Inc.
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Inoue K
Technol. Res. Inst. Osaka Prefecture Osaka Jpn
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Iga K
Microsystem Research Center P & I Lab . Tokyo Institute Of Technology
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Iga K
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Matsutani A
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Matsutani Akihiro
Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Yamakage Hirokazu
Shin-etsu Chemical Co. Ltd.
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Ohashi Ken
Shin-etsu Chemical Co. Ltd.
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YOKOYAMA Tomonori
Shin-Etsu Chemical Co., Ltd.
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MUTA Seiichi
Samco International Inc.
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Koyama Fumio
Microsystem Research Center, P & I Lab., Tokyo Institute of Technology
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Koyama Fumio
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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KOYAMA Fumio
Microsystem Research Center, Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Ohashi Ken
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Matsutani Akihiro
Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-3, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Ohtsuki Hideo
Samco International Inc., 36 Waraya-cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Hideo Ohtsuki
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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Ohtsuki Hideo
Samco International Inc., 36 Tanakamiya-cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Matsutani Akihiro
Technical Department, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Yamakage Hirokazu
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Iga Kenichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Yokoyama Tomonori
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Akihiro Matsutani
Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-3, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku, Yokohama 226-8503, Japan
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Ohtsuki Hideo
Samco International Inc., 33 Tanakamiya-Cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Iga Kenichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku, Yokohama 226-8503, Japan
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Matsutani Akihiro
Semiconductor and MEMS Processing Center, Technical Department, Tokyo Institute of Technology
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Hashidume Yuuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
著作論文
- In situ Observation of Etching Profile in Inductively Coupled Plasma Etching of GaAs and InP using Long Distance Microscope
- Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl_2
- Cl_2-based Inductively Coupled Plasma Etching of InP Using Internal Antenna
- Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP
- Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl_2 Inductively Coupled Plasma
- Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl_2/Xe
- Vertical and Smooth Etching of InP by Cl_2/Xe Inductively Coupled Plasma
- Reactive Ion Etching of Si Using Ar/F2 Plasma
- Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl/Xe-Inductively Coupled Plasma Etching (Special Issue : Microprocesses and Nanotechnology)
- Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma
- Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet
- Generation of Solid-Source H2O Plasma and Its Application to Dry Etching of CaF2
- Solid Source Dry Etching Process for GaAs and InP
- Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP
- Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl2/Xe
- Iodine Solid Source Inductively Coupled Plasma Etching of InP