Matsutani Akihiro | Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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概要
- Matsutani Akihiroの詳細を見る
- 同名の論文著者
- Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japanの論文著者
関連著者
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Matsutani Akihiro
Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
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Matsutani Akihiro
Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-3, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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Takada Ayako
Bio-Technical Center, Technical Department, Tokyo Institute of Technology, B-41, 4259 Nagatsuta, Midori-ku, Yokohama 226-8501, Japan
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Hideo Ohtsuki
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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Akihiro Matsutani
Center for Semiconductor and MEMS Processes, Technical Department, Tokyo Institute of Technology, R2-3, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
著作論文
- High-Frequency Single-Cell Isolation of Bacteria Using Microenclosure Array with Multipillar Structure
- Reactive Ion Etching of Si Using Ar/F2 Plasma
- Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma