Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet
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概要
- 論文の詳細を見る
We demonstrated the formation of high-density plasma using a SmCo ring magnet and its application to the vertical and smooth etching of InP. It is found that the high-density plasma using the magnet is well confined inside the magnetic fields. The ion density of the plasma using the magnet is much higher than that of the plasma without the magnet at the same input RF power. The etching profile and the roughness of the etched bottom surface are improved using the high-density plasma. The proposed dry etching technique using the high-density plasma formed with a magnet will become an effective technique for the microfabrication of semiconductors or other materials.
- Japan Society of Applied Physicsの論文
- 2004-07-15
著者
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Yamakage Hirokazu
Shin-etsu Chemical Co. Ltd.
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Ohashi Ken
Shin-etsu Chemical Co. Ltd.
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OHTSUKI Hideo
Samco International Inc.
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YOKOYAMA Tomonori
Shin-Etsu Chemical Co., Ltd.
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Matsutani Akihiro
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
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Koyama Fumio
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Ohashi Ken
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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Ohtsuki Hideo
Samco International Inc., 36 Waraya-cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Yamakage Hirokazu
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Yokoyama Tomonori
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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