Matsutani Akihiro | Precision And Intelligence Laboratory Tokyo Institute Of Technology
スポンサーリンク
概要
関連著者
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Matsutani Akihiro
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
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Koyama Fumio
Research Laboratory Of Precision Machinery And Electronics Tokyo Institute Of Technology
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Iga Kenichi
Precision & Intelligence Lab., Tokyo Institute of Technology
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Arai M
Microsystem Research Center P&i Laboratories Tokyo Institute Of Technology
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Koyama Fumio
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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MATSUTANI Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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OHTSUKI Hideo
Samco International Inc.
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Matsutani A
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Azuchi Munechika
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Murakami A
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Iga K
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Ohtsuki Hideyo
Samco International Inc.
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Inoue K
Technol. Res. Inst. Osaka Prefecture Osaka Jpn
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Iga K
Microsystem Research Center P & I Lab . Tokyo Institute Of Technology
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Mukaihara Toshikazu
Precision & Intelligence Lab., Tokyo Institute of Technology
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Miyamoto Takanori
Ntt Interdisciplinary Research Laboratories
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Kato Junichi
Ntt Lsi Laboratories
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Kato Junichi
Ntt System Electronics Laboratories
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Kato J
Ntt Telecommunications Energy Lab. Kanagawa Jpn
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Kato J
Ntt Lsi Laboratories
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MITSUGI Satoshi
NTT Basic Research Laboratories, NTT Corp.
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Mitsugi Satoshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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SHINADA Satoshi
Precision & Intelligence Laboratory, Tokyo Institute of Technology
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NISHIYAMA Nobuhiko
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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ARAI Masakazu
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Mitsugi S
Ntt Basic Research Laboratories Ntt Corp.
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Shinada S
National Institute Of Information And Communications Technology
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Matsutani Akihiro
Tokyo Inst. Technol. Yokohama Jpn
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Nishiyama N
Microsystem Research Center Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Koyama Fumio
Microsystem Research Center, P & I Lab., Tokyo Institute of Technology
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KOYAMA Fumio
Microsystem Research Center, Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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藤田 雅之
レーザー技術総合研究所
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Hatori Nobuaki
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Kato Junnichi
Precision & Intelligence Lab., Tokyo Institute of Technology
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Abe M
Mitsui Chemicals Inc. Tokyo Jpn
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ABE Makoto
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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OHNOKI Noriyuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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MIZUTANI Akimasa
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Yamakage Hirokazu
Shin-etsu Chemical Co. Ltd.
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Ohashi Ken
Shin-etsu Chemical Co. Ltd.
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Ohnoki Noriyuki
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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KATO Junichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Fujita Masayuki
Yokohama National University Department Of Electrical And Computer Engineering
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FUJITA Masayuki
Faculty of Electrical and Computer Engineering, Yokohama National University
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USHIGOME Reona
Faculty of Electrical and Computer Engineering, Yokohama National University
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BABA Toshihiko
Faculty of Electrical and Computer Engineering, Yokohama National University
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BABA Toshihiko
Division of Electrical and Computer Engineering, Yokohama National University
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Baba T
Fundamental Research Laboratories Nec Corporation:(present Office)silicon System Laboratories Nec Co
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Ohtake N
Niigata Univ. Niigata Jpn
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Ushigome Reona
Yokohama National University Department Of Electrical And Computer Engineering
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Baba T
Yokohama National Univ. Yokohama‐shi Jpn
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YOKOYAMA Tomonori
Shin-Etsu Chemical Co., Ltd.
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MUTA Seiichi
Samco International Inc.
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Baba Toshihiko
Faculty Of Electrical And Computer Engineering Yokohama National University
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Fujita Masayuki
Faculty Of Electrical And Computer Engineering Yokohama National University
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Koyama Fumio
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Ohashi Ken
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Ohtsuki Hideo
Samco International Inc., 36 Waraya-cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Ohtsuki Hideo
Samco International Inc., 36 Tanakamiya-cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Yamakage Hirokazu
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, R2-21, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Iga Kenichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology,
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Iga Kenichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Yokoyama Tomonori
Shin-Etsu Chemical Co., Ltd., 1-5 Kitago 2-chome, Takefu-shi, Fukui 915-8515, Japan
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology,
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Matsutani Akihiro
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku, Yokohama 226-8503, Japan
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Ohtsuki Hideo
Samco International Inc., 33 Tanakamiya-Cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
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Iga Kenichi
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku, Yokohama 226-8503, Japan
著作論文
- Correlation Length Measurement of Sidewall Roughness of Dry Etched Facet and Its Effect on Reflectivity
- GaInAs/GaAs Micro-Arc Ring Semiconductor Laser
- Characterization of Residual Stress in Active Region due to AlAs Native Oxide of Vertical-Cavity Surface-Emitting Lasers
- In situ Observation of Etching Profile in Inductively Coupled Plasma Etching of GaAs and InP using Long Distance Microscope
- InGaAs/GaAs Strained Quantum Well Lasers with Etched Micro-Corner Reflectors
- GaInAsP Microcylinder (Microdisk) Injection Laser With AlInAs (O_x) Claddings : Optics and quantum Electronics
- Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl_2
- Cl_2-based Inductively Coupled Plasma Etching of InP Using Internal Antenna
- Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP
- Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl_2 Inductively Coupled Plasma
- Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl_2/Xe
- Vertical and Smooth Etching of InP by Cl_2/Xe Inductively Coupled Plasma
- Characterization of Sidewall Damage Induced by Reactive Ion-Beam Etching
- Reactive Ion Beam Etch of GaInAsP/InP Multilayer and Removal of Damaged Layer by Two-Step Etch
- Highly Stable Single Polarization Operation of GaInAs/GaAs Vertical-Cavity Surface-Emitting Laser on GaAs(311)B Substrate under High-Speed Modulation
- Vertical-Cavity Surface-Emitting Laser Array on GaAs(311)B Substrate Exhibiting Single-Transverse Mode and Stable-Polarization Operation
- Relationship Between Type of Bow Holding and Propagation of Performed Sound in Small Concert Hall in Violin Performances
- Study of Rosin Particles on Bow Hair in Violin Performance (Short Note)
- Measurement of Force of Bow Holding and Contact Force between Bow Hair and String in Violin Playing by Pressure Measuring Film : General Physics
- Study on Bridge of Violin by Photoelastic Observation
- Low Bias Voltage Dry Etching of InP by Inductively Coupled Plasma Using SiCl_4/Ar
- C_ Resist Mask of Electron Beam Lithography for Chlorine-Based Reactive Ion Beam Etching
- Surface Temperature Increase in Reactive Ion Beam Etch and Improvement of Profiles by Multistep Etching
- Measurement of Sidewall Roughness of InP Etched by Reactive Ion Bearn Etching
- Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet
- Solid Source Dry Etching Process for GaAs and InP
- Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP
- Plasma Characterization in Chlorine-Based Reactive Ion Beam Etching and Chemically Assisted Ion Beam Etching
- Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl2/Xe
- Iodine Solid Source Inductively Coupled Plasma Etching of InP
- Study of Relationship between Performed Tones and Force of Bow Holding using Silent Violin