Hashidume Yuuki | Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan

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概要

関連著者

Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
Matsutani Akihiro
Semiconductor and MEMS Processing Center, Technical Department, Tokyo Institute of Technology
Hashidume Yuuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan

著作論文

Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl/Xe-Inductively Coupled Plasma Etching (Special Issue : Microprocesses and Nanotechnology)

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