Matsutani Akihiro | Semiconductor and MEMS Processing Center, Technical Department, Tokyo Institute of Technology
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概要
- Matsutani Akihiroの詳細を見る
- 同名の論文著者
- Semiconductor and MEMS Processing Center, Technical Department, Tokyo Institute of Technologyの論文著者
関連著者
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Matsutani Akihiro
Semiconductor and MEMS Processing Center, Technical Department, Tokyo Institute of Technology
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ISOBE Toshihiro
Department of Metallurgy & Ceramic Science, Tokyo Institute of Technology
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Matsushita Sachiko
Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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Nakajima Akira
Department Of Applied Electronics Tokyo Institute Of Technology
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Koyama Fumio
Precision And Intelligence Laboratory Microsystem Research Center Tokyo Institute Of Technology
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Shimada Toshikazu
Photonics Integration System Research Center Precision And Intelligence Laboratory Tokyo Institute O
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Gu Xiaodong
Photonics Integration System Research Center Precision And Intelligence Laboratory Tokyo Institute O
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Ohtsuki Hideo
Samco Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto 612-8443, Japan
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Isobe Toshihiro
Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
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Hayashi Mikiro
Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
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Morii Yasushi
Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
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Nishioka Kunio
Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Gu Xiaodong
Photonics Integration System Researchenter Center, Precision and Intelligence Laboratoy, Toklyo Instituteof Technology
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Shimizu Shoki
Photonics Integration System Researchenter Center, Precision and Intelligence Laboratoy, Toklyo Instituteof Technology
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Koyamai Fumio
Photonics Integration System Researchenter Center, Precision and Intelligence Laboratoy, Toklyo Instituteof Technology
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Hashidume Yuuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
著作論文
- Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl/Xe-Inductively Coupled Plasma Etching (Special Issue : Microprocesses and Nanotechnology)
- SF6-Based Deep Reactive Ion Etching of (001) Rutile TiO2 Substrate for Photonic Crystal Structure with Wide Complete Photonic Band Gap
- C-4-30 Demonstration of an Electro-absorption Optical Modulator based onBragg Refiector Waveguide with Ultra-low Driving Voltage