SF6-Based Deep Reactive Ion Etching of (001) Rutile TiO2 Substrate for Photonic Crystal Structure with Wide Complete Photonic Band Gap
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概要
- 論文の詳細を見る
We demonstrated the fabrication of a photonic crystal structure of a (001) rutile TiO2 substrate by deep reactive ion etching (RIE) using SF6 plasma. A vertical etching profile and a smooth etched surface, which satisfy the requirements for optical device application, were obtained. We think that this proposed process is useful for the microfabrication of TiO2-crystal-based optical devices, such as photonic crystals with a complete photonic band gap (CPBG) and optical waveguides.
- 2012-09-25
著者
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ISOBE Toshihiro
Department of Metallurgy & Ceramic Science, Tokyo Institute of Technology
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Matsushita Sachiko
Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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Nakajima Akira
Department Of Applied Electronics Tokyo Institute Of Technology
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Isobe Toshihiro
Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
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Matsutani Akihiro
Semiconductor and MEMS Processing Center, Technical Department, Tokyo Institute of Technology
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Hayashi Mikiro
Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
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Morii Yasushi
Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
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Nishioka Kunio
Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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