New Evaluation Method of Resist Coating Using Heterodyne Holographic Wafer Alignment
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-07-15
著者
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Yamashita Kazuhiro
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Nomura Noboru
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Nomura Noboru
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
Yamashita Kazuhiro
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
YAMASHITA Kazuhiro
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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- Overlay Accuracy Measurement Technique Using the Latent Image on a Chemically Amplified Resist
- A New Analytical Technique for Evaluating Standing Wave Effect of Chemically Amplified Positive Resist
- New Evaluation Method of Resist Coating Using Heterodyne Holographic Wafer Alignment
- Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process
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