Photo-Induced Radical Polymerization Sensitized by Benzoquinonylsulfanyl Derivatives
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概要
著者
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白井 正充
大阪府立大学大学院工学研究科
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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QU Weihong
Department of Applied Chemistry, Osaka Prefecture University
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Qu Weihong
Department Of Applied Chemistry Osaka Prefecture University
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Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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