Characterization of Chemically Amplified Resists with"Acid Amplifier"for 193nm Lithography
スポンサーリンク
概要
著者
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Matsuo T
Semiconductor Leading Edge Technologies Inc
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Takahashi M
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Ohfuji T
Semiconductor Leading Edge Technologies Inc. (selete)
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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