Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-11-15
著者
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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OHFUJI Takeshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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SASAGO Masaru
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Kanzaki Kenichi
The Institute Of Scientific And Industrial Research Osaka University
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Tagawa S
Osaka Univ. Osaka
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Sasago Masaru
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)uls
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Ohfuji T
Semiconductor Leading Edge Technologies Inc. (selete)
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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