Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists
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概要
- 論文の詳細を見る
In lithography, normalized image log slope (NILS) is an important metric that describes the quality of an aerial image of incident photons. The aerial image is converted to a latent image through lithographic processes in the resist. The quality of the latent image correlates with line edge roughness (LER). Chemical gradient is also an important metric that describes the quality of a latent image. In this study, we investigated the relationship between NILS and chemical gradient in chemically amplified resists for extreme ultraviolet lithography. In particular, the effect of effective reaction radius for catalytic chain reactions on the relationship between NILS and chemical gradient was clarified.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2010-06-25
著者
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Kozawa Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Seiichi Tagawa
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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