Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser

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概要

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• Extreme-ultraviolet free-electron lasers (EUVFELs) producing intense femtosecond pulse are able to superimpose ion-pair formation induced by a single photon onto the other in the resist polymer degradation. Electron beam resist (ZEP520A) sensitivity was obtained by using 61 nm EUVFEL at different dose densities in order to observe the multiple spur effect in a well-controlled environment. A higher ionization density has been identified to suppress the resist-degradation effectiveness due to the multiple spur effect for the first time. This is explained by two competing effects, namely, spatiotemporal overlap reducing the effectiveness, and high radical concentration enhancing cross-linking efficiency.

• 2012-09-25

著者

• YABASHI Makina

  RIKEN

• OHASHI Haruhiko

  Japan Synchrotron Radiation Research Institute

• Kozawa Takahiro

  The Institute Of Scientific And Industrial Research Osaka University

• KIMURA Hiroaki

  Japan Synchrotron Radiation Research Institute

• Nagasono Mitsuru

  Riken Xfel Project Head Office

• Kameshima Takashi

  Riken

• Senba Yasunori

  Japan Synchrotron Radiation Res. Inst. Hyogo Jpn

• OKAMOTO Kazumasa

  Faculty of Engineering, Hokkaido University

• OIKAWA Keita

  Faculty of Engineering, Hokkaido University

• HATSUI Takaki

  RIKEN Harima Institute

• TOGASHI Tadashi

  Japan Synchrotron Radiation Research Institute

• TONO Kensuke

  Japan Synchrotron Radiation Research Institute

• FUJIYOSHI Ryoko

  Faculty of Engineering, Hokkaido University

• SUMIYOSHI Takashi

  Faculty of Engineering, Hokkaido University

• Yabashi Makina

  RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan

• Hatsui Takaki

  RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan

• Kozawa Takahiro

  The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan

• Kimura Hiroaki

  Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan

• Kameshima Takashi

  RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan

• Ohashi Haruhiko

  Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan

• NAGASONO Mitsuru

  RIKEN Harima Institute

• Nagasono Mitsuru

  RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan

• KOZAWA Takahiro

  The Institute of Scientific and Industrial Research (ISIR), Osaka University

• Fujiyoshi Ryoko

  Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan

• Togashi Tadashi

  Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan

• Senba Yasunori

  Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan

• Tono Kensuke

  Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan

• Oikawa Keita

  Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan

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