Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
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概要
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Extreme-ultraviolet free-electron lasers (EUVFELs) producing intense femtosecond pulse are able to superimpose ion-pair formation induced by a single photon onto the other in the resist polymer degradation. Electron beam resist (ZEP520A) sensitivity was obtained by using 61 nm EUVFEL at different dose densities in order to observe the multiple spur effect in a well-controlled environment. A higher ionization density has been identified to suppress the resist-degradation effectiveness due to the multiple spur effect for the first time. This is explained by two competing effects, namely, spatiotemporal overlap reducing the effectiveness, and high radical concentration enhancing cross-linking efficiency.
- 2012-09-25
著者
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YABASHI Makina
RIKEN
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OHASHI Haruhiko
Japan Synchrotron Radiation Research Institute
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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KIMURA Hiroaki
Japan Synchrotron Radiation Research Institute
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Nagasono Mitsuru
Riken Xfel Project Head Office
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Kameshima Takashi
Riken
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Senba Yasunori
Japan Synchrotron Radiation Res. Inst. Hyogo Jpn
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OKAMOTO Kazumasa
Faculty of Engineering, Hokkaido University
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OIKAWA Keita
Faculty of Engineering, Hokkaido University
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HATSUI Takaki
RIKEN Harima Institute
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TOGASHI Tadashi
Japan Synchrotron Radiation Research Institute
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TONO Kensuke
Japan Synchrotron Radiation Research Institute
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FUJIYOSHI Ryoko
Faculty of Engineering, Hokkaido University
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SUMIYOSHI Takashi
Faculty of Engineering, Hokkaido University
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Yabashi Makina
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Hatsui Takaki
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Kozawa Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Kimura Hiroaki
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Kameshima Takashi
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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Ohashi Haruhiko
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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NAGASONO Mitsuru
RIKEN Harima Institute
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Nagasono Mitsuru
RIKEN Harima Institute, Sayo, Hyogo 679-5148, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Fujiyoshi Ryoko
Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan
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Togashi Tadashi
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Senba Yasunori
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Tono Kensuke
Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
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Oikawa Keita
Faculty of Engineering, Hokkaido University, Sapporo 080-6028, Japan
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