Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography
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概要
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The uniformity of acid generator distribution and the length of acid diffusion are serious problems in the development of resist materials used for the 16 nm node and below. Anion-bound polymers in which the anion part of onium salts is polymerized have attracted much attention for solving these problems. In this study, the reaction mechanism of an anion-bound polymer in cyclohexanone was clarified using pulse radiolysis. The design of an efficient electron and hole transfer system is essential to the enhancement of resist performance.
- 2013-01-25
著者
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Utsumi Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Kanagawa 253-0114, Japan
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Komuro Yoshitaka
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Ohomori Katsumi
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan
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Utsumi Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan
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