Study on Positive--Negative Inversion of Chlorinated Resist Materials
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概要
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The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive--negative inversion induced by EB were attempted to be clarified with ultraviolet--visible (UV--vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (${>}5$ mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.
- 2011-07-25
著者
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TAGAWA Seiichi
Research Center for Nuclear Science and Technology, The University of Tokyo
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Washio Masakazu
Research Institute For Science And Engineering Waseda University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Oshima Akihiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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GOWA OYAMA
Research Institute of Science and Engineering, Waseda University
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