Effect of Ultrahigh-Density lonization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
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概要
- 論文の詳細を見る
- 2012-09-25
著者
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YABASHI Makina
RIKEN
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SENBA Yasunori
Japan Synchrotron Radiation Research Institute
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OHASHI Haruhiko
Japan Synchrotron Radiation Research Institute
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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KIMURA Hiroaki
Japan Synchrotron Radiation Research Institute
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Nagasono Mitsuru
Riken Xfel Project Head Office
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Kameshima Takashi
Riken
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Senba Yasunori
Japan Synchrotron Radiation Res. Inst. Hyogo Jpn
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YABASHI Makina
RIKEN Harima Institute
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OKAMOTO Kazumasa
Faculty of Engineering, Hokkaido University
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OIKAWA Keita
Faculty of Engineering, Hokkaido University
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HATSUI Takaki
RIKEN Harima Institute
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TOGASHI Tadashi
Japan Synchrotron Radiation Research Institute
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TONO Kensuke
Japan Synchrotron Radiation Research Institute
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FUJIYOSHI Ryoko
Faculty of Engineering, Hokkaido University
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SUMIYOSHI Takashi
Faculty of Engineering, Hokkaido University
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Kozawa Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KAMESHIMA Takashi
RIKEN Harima Institute
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NAGASONO Mitsuru
RIKEN Harima Institute
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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