Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator
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概要
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Chemically amplified resists with an acid generator, the anion of which is bound to the polymer through a covalent bond (anion-bound resists), are promising materials for the 16 nm node and beyond. However, their reaction mechanism is unknown. In this study, we propose a proton diffusion model for anion-bound resists. To examine the proton diffusion model, we carried out resist-patterning experiments and a simulation. The calculated latent images corresponded well to the measured line width and estimated chemical gradient. This result suggests that protons diffuse under the electric field produced by anions and induce acid-catalytic reactions in anion-bound resists.
- 2012-07-25
著者
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Santillan Julius
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Santillan Julius
EUVL Infrastructure Development Center, Inc. (EIDEC), Tsukuba, Ibaraki 305-8569, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Itani Toshiro
EUVL Infrastructure Development Center, Inc. (EIDEC), Tsukuba, Ibaraki 305-8569, Japan
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