Itani Toshiro | Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
スポンサーリンク
概要
関連著者
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Itani Toshiro
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Santillan Julius
Euvl Infrastructure Dev. Center Inc. (eidec) Ibaraki Jpn
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Itani Toshiro
EUVL Infrastructure Development Center, Inc. (EIDEC), Tsukuba, Ibaraki 305-8569, Japan
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Santillan Julius
EUVL Infrastructure Development Center, Inc. (EIDEC), Tsukuba, Ibaraki 305-8569, Japan
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Itani Toshiro
Euvl Infrastructure Development Center Inc. (eidec)
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Santillan Julius
Euvl Infrastructure Development Center Inc. (eidec)
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Erdmann Andreas
Fraunhofer IISB
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Itani Toshiro
EUVL Infrastructure Development Center, Inc.
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Itani Toshiro
EUVL Infrastructure Development Center, Inc., Tsukuba, Ibaraki 305-8569, Japan
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Toriumi Minoru
EUVL Infrastructure Development Center, Inc.
著作論文
- Resist Properties Required for 6.67nm Extreme Ultraviolet Lithography
- Resist Materials and Processes for Extreme Ultraviolet Lithography
- Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator
- Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator
- Acid Diffusion Length in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography
- Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
- An In situ Analysis of the Dissolution Characteristics of Half Pitch Line and Space Extreme Ultraviolet Lithography Resist Patterns
- Inhomogeneity of PAGs in Resist Film studied by Molecular Dynamics Simulations