Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography
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概要
- 論文の詳細を見る
- 2013-01-25
著者
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Utsumi Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa, Kanagawa 253-0114, Japan
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Ohomori Katsumi
Tokyo Ohka Kogyo Co., Ltd., Samukawa, Kanagawa 253-0114, Japan
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KOMURO Yoshitaka
The Institute of Scientific and Industrial Research, Osaka University
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OHOMORI Katsumi
Tokyo Ohka Kogyo Co., Ltd.
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UTSUMI Yoshiyuki
Tokyo Ohka Kogyo Co., Ltd.
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