Preparation and Characterization of Fluorocarbon Thin Films Deposited by Soft X-Ray Ablation of Polytetrafluoroethylene
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概要
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Fluorocarbon films have been deposited by soft X-ray ablation of polytetrafluoroethylene (PTFE) and characterized as low-dielectric-constant interlayer dielectrics. Very rapid deposition of such films at about 1500 nm/min could be achieved at room temperature, and the dielectric constant of the deposited films is about 2.1. Fourier transform infrared spectroscopy (FT-IR) measurement results suggest that the deposited films are formed primarily as one-dimensional chains of (–CF2–)n which are cross-linked partially. The cross-link density increases with increasing deposition temperature, and their thermal stability improves. However, the dielectric constant of the films increased abruptly above 300°C.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-06-01
著者
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Ueno Masato
Department Of Neurosurgery Osaka Neurological Institute
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OHASHI Haruhiko
Japan Synchrotron Radiation Research Institute
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OKUMOTO Masaki
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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KITAI Satoshi
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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Okuyama Masanori
Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University
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Kanashima Takeshi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Kohma Norihiro
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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Okuyama Masanori
Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Maida Osamu
Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Kitai Satoshi
Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Ohashi Haruhiko
Japan Synchrotron Radiation Research Institute, 1-1-1 Kouto, Mikazuki-cho, Sayo-gun, Hyogo 679-5198, Japan
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Kanashima Takeshi
Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Okumoto Masaki
Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Ueno Masato
Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Kohma Norihiro
Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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