Preparation of BiFeO<sub>3</sub> Thin Films on SrRuO<sub>3</sub>/SrTiO<sub>3</sub>(001) Substrate by Dual Ion Beam Sputtering
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概要
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BiFeO<sub>3</sub> (BFO) thin films with various Bi/Fe ratios have been deposited on SrRuO<sub>3</sub>/SrTiO<sub>3</sub>(001) substrates by dual ion beam sputtering. A Bi<sub>2</sub>O<sub>3</sub> ceramic disk and an $\alpha$-Fe<sub>2</sub>O<sub>3</sub> powder disk were used as targets, and simultaneously sputtered using a dual ion beam. Bi/Fe ratio has been controlled by adjusting the beam current ratio on the Bi<sub>2</sub>O<sub>3</sub>- and $\alpha$-Fe<sub>2</sub>O<sub>3</sub>-side ion sources. Even a BFO thin film with a Bi/Fe ratio of 0.95 and a smooth surface shows a slightly leaky characteristic. $[\text{Fe$^{2+}$}]/([\text{Fe$^{3+}$}]+[\text{Fe$^{2+}$}])$ ratio has been estimated by Auger electron spectroscopy (AES). From the AES profiles, the $[\text{Fe$^{2+}$}]/([\text{Fe$^{3+}$}]+[\text{Fe$^{2+}$}])$ ratio of the BFO thin film with a Bi/Fe ratio of 0.95 is estimated to be 0.14. It is considered that not only improving surface roughness but also enhancing oxidization is important for reduction in leakage current.
- 2011-09-25
著者
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KOBUNE Masafumi
Department of Material Science Chemistry, Graduate School of Engineering, University of Hyogo
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Fujisawa Hironori
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Hitneji
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Kanashima Takeshi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Shimizu Masaru
Department Of Chemical Engineering Faculty Of Engineering Tokyo University Of Agriculture And Techno
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Park Jung
Department Electrical Engineering Busan National University
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Nishioka Hiroshi
Department Of Electronics Nagoya Institute Of Technology
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Okuyama Masanori
Institute for NanoScience Design, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Nakashima Seiji
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2201, Japan
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Nishioka Hiroshi
Department of Materials Science and Chemistry, Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2201, Japan
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Suminaga Hiroyuki
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2201, Japan
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Park Jung
Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
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Fujisawa Hironori
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2201, Japan
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