Characterization of (Bi3.25Nd0.75)Ti3O12 Thin Films with $a$- and $b$-Axis Orientations Deposited on Nb:TiO2 Substrates by High-Temperature Sputtering

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$a$- and $b$-axis-oriented (Bi3.25Nd0.75)Ti3O12 (BNT-0.75) films, 3.0 μm thick, were fabricated on conductive Nb:TiO2(101) substrates with 0.001–0.79 mass % Nb at 650 °C by high-temperature sputtering. All the films had a mostly single-phase orthorhombic structure and $a$- and $b$-axis orientations. The degree of $a$- and $b$-axis orientations was high, with values of ${\geq}96$%. BNT-0.75 films grown heteroepitaxially on Nb:TiO2(101) substrates containing 0.79 mass % Nb were comprised of nanoplate-like crystals and exhibited the best hysteresis loop shapes, with a remanent polarization ($2P_{\text{r}}$) of 29 μC/cm2 and a coercive field ($2E_{\text{c}}$) of 297 kV/cm.
2010-09-25