Contactless Characterization of Fixed Charges in HfO_2 Thin Film from Photoreflectance
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-04-30
著者
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Fujimoto Akira
Department Of Electrical Engineering Wakayama National College Of Technology
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Fujimoto A
Wakayama National Coll. Technol. Wakayama Jpn
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KANASHIMA Takeshi
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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OKUYAMA Masanori
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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Ikeda Kouji
Area Of Advanced Electronics And Optical Science Department Of Systems Innovation Graduate School Of
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Kanashima Takeshi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Yoshida Masato
Area Of Advanced Electronics And Optical Science Department Of Systems Innovation Graduate School Of
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SOHGAWA Masayuki
Area of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School
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NAOYAMA Takuji
Area of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School
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TADA Taizou
Area of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School
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