A study of an Organic Bottom Antireflective Coating for 157-nm Lithography
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概要
著者
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Irie S
Semiconductor Leading Edge Technologies Ibaraki Jpn
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Irie Shigeo
Semiconductor Leading Edge Technologies Inc. (selete)
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Shigematsu M
Selete Tsukuba Jpn
関連論文
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- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- 157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers
- Characterization of Fluoropolymer Resist for 157-nm Lithography
- Application of a New BARC Material for 157-nm Lithography
- A study of an Organic Bottom Antireflective Coating for 157-nm Lithography