Bilayer Resist Method for Room-Temperature Nanoimprint Lithography
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-06-30
著者
-
OCHIAI Yukinori
NEC Fundamental and Environmental Research Laboratories
-
NAMATSU Hideo
NTT Basic Research Laboratories
-
MATSUI Shinji
Graduate School of Science, University of Hyogo
-
Morita Takahiko
Crest-jst
-
MATSUO Takahiro
Matsushita Electric Industrial Co., Ltd. (Panasonic)
-
SASAGO Masaru
Matsushita Electric Industrial Co., Ltd. (Panasonic)
-
NAKAMATSU Ken-ichiro
Graduate School of Science, LASTI, Himeji Institute of Technology
-
WATANABE Keiichiro
Graduate School of Science, LASTI, Himeji Institute of Technology
-
TONE Katsuhiko
Graduate School of Science, LASTI, Himeji Institute of Technology
-
KATASE Tetsuya
Meisyo Co.
-
HATTORI Wataru
NEC Fundamental Research Labs
-
KOMURO Masanori
Advanced Semiconductor Research Center, AIST
関連論文
- Room Temperature Nanoimprinting Using Release-Agent Spray-Coated Hydrogen Silsesquioxane
- Diameter-Controlled Carbon Nanotubes Grown from Lithographically Defined Nanoparticles
- Si Single-Electron Devices : Recent Attempts towards High Performance and Functionality
- A Si Memory Device Composed of a One-Dimensional Metal-Oxide-Semiconductor Field-Effect-Transistor Switch and a Single-Electron-Transistor Detector
- Sub-10-nm Overlay Accuracy in Electron Beam Lithography for Nanometer-Scale Device Fabrication
- Suppression of Effects of Parasitic Metal-Oxide-Semiconductor Field-Effect Transistors on Si Single-Electron Transistors
- Suppression of Unintentional Formation of Parasitic Si Islands on a Si Single-Electron Transistor by the Use of SiN Masked Oxidation
- Three-Dimensional Nanostructure Fabrication by Focused-Ion-Beam Chemical Vapor Deposition and Its Applications(Micro/Nano Fabrication,Microoptomechatronics)
- Line-Edge Roughness: Characterization and Material Origin
- Single-Electron Transistor and Current-Switching Device Fabricated by Vertical Pattern-Dependent Oxidation
- Fabrication of SiO_2/Si/SiO_2 Double Barrier Diodes using Two-Dimensional Si Structures
- Photoemission study of the Au-SrTiO3(100) surface (特集 量子ビームによるナノバイオ科学と基盤技術)
- X-Ray Photoelectron Spectroscopy Study of Synchrotron Radiation Irradiation of a Polytetrafluoroethylene Surface
- Evaluation of Vacuum Microcapsule Fabricated using Focused-Ion-Beam Chemical-Vapor-Deposition
- Fabrication of Diamond-Like Carbon Nanosprings by Focused-Ion-Beam Chemical Vapor Deposition and Evaluation of Their Mechanical Characteristics(Micro/Nano Fabrication,Microoptomechatronics)
- "Mask Enhancer" Technology on ArF Immersion Tool for 45-nm-Node Complementary Metal Oxide Semiconductor with 0.249μm^2 Static Random Access Memory Contact Layer Fabrication
- Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
- Growth Manner and Mechanical Characteristics of Amorphous Carbon Nanopillars Grown by Electron-Beam-Induced Chemical Vapor Deposition
- Position-Controlled Carbon Fiber Growth Catalyzed Using Electron Beam-Induced Chemical Vapor Deposition Ferrocene Nanopillars
- Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition
- Bilayer Resist Method for Room-Temperature Nanoimprint Lithography
- Nozzle-Nanostructure Fabrication on Glass Capillary by Focused-Ion-Beam Chemical Vapor Deposition and Etching
- Three-Dimensional Nanoimprint Mold Fabrication by Focused-Ion-Beam Chemical Vapor Deposition
- Resist Thinning Effect on Nanometer-Scale Line-Edge Roughness : Instrumentation, Measurement, and Fabrication Technology
- A New Approach to Reducing Line-Edge Roughness by Using a Cross-Linked Positive-Tone Resist
- Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography
- Sub-10-nm Si Lines Fabricated Using Shifted Mask Patterns Controlled with Electron Beam Lithography and KOH Anisotropic Etching
- Fabrication of One-Dimensional Silicon Nanowire Structures with a Self-Aligned Point Contact
- Three-Dimensional Nanofabrication with 10-nm Resolution
- Effect of Chelating Agents on High Resolution Electron Beam Nanolithography of Spin-Coatable Al_2O_3 Gel Films
- Edge-Enhancement Writing for Electron Beam Nanolithography
- Carbon Multiprobes with Nanosprings Integrated on Si Cantilever Using Focused-Ion-Beam Technology
- Nanometrology of Si Nanostructures Embedded in SiO_2 using Scanning Electron Microscopy
- Evaluation of Field Electron Emitter Fabricated Using Focused-Ion-Beam Chemical Vapor Deposition
- Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
- Synchrotron Radiation Effect in the Soft X-ray Region on the Surface Properties of Pyromellitic Dianhydride-Oxydianline Polyimide
- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- A Method for Assembling Nano-Electromechanical Devices on Microcantilevers Using Focused Ion Beam Technology
- Nano-Four-Point Probes on Microcantilever System Fabricated by Focused Ion Beam
- Three-Dimensional Resist-Coating Technique and Nanopatterning on a Cube Using Electron-Beam Lithography and Etching
- Eectron-Beam Diameter Measurement Using a Knife Edge with a Visor for Scattering Eectrons
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
- Improvement of Imprinted Pattern Uniformity Using Sapphire Mold
- Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer
- A Spin-Polarized Scanning Electron Microscope with 5-nm Resolution : Instrumentation, Measurement, and Fabrication Technology
- Investigating Line-Edge Roughness in Calixarene Fine Patterns Using Fourier Analysis
- H205 EVALUATION OF RELATIVE VELOCITY BETWEEN SINGLE BUBBLES AND LIQUID IN HORIZONTAL TURBULENT PIPE FLOW(Bubble behavior)
- Binary-Solvent Developer for Cross-Linked Positive-Tone Resists
- Fluorinated Diamond-Like Carbon Coating as Antisticking Layer on Nanoimprint Mold
- A Method for Assembling Nano-Electromechanical Devices on Microcantilevers Using Focused Ion Beam Technology
- Examination of Focused-Ion-Beam Repair Resolution for UV-Nanoimprint Templates
- Nozzle-Nanostructure Fabrication on Glass Capillary by Focused-Ion-Beam Chemical Vapor Deposition and Etching
- Diameter-Controlled Carbon Nanotubes Grown from Lithographically Defined Nanoparticles
- Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient
- Room-Temperature Nanoimprinting Using Ladder Hydrogen Silsesquioxane
- Bilayer Resist Method for Room-Temperature Nanoimprint Lithography
- Three-Dimensional Nanoimprint Mold Fabrication by Focused-Ion-Beam Chemical Vapor Deposition
- Nano-Four-Point Probes on Microcantilever System Fabricated by Focused Ion Beam
- Suppression of Effects of Parasitic Metal-Oxide-Semiconductor Field-Effect Transistors on Si Single-Electron Transistors
- Back-Gate Effect on Coulomb Blockade in Silicon-on-Insulator Trench Wires
- Three-Dimensional Nanofabrication with 10-nm Resolution
- Line-Edge Roughness: Characterization and Material Origin
- The Impact of Supercritical Fluoro-Compounds on Lithography Use
- Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
- Carbon Multiprobe on a Si Cantilever for Pseudo-Metal–Oxide–Semiconductor Field-Effect-Transistor
- Supercritical Improvement of Resist Patterns by Introducing Functional Molecules
- Electron-Beam Diameter Measurement Using a Knife Edge with a Visor for Scattering Electrons
- Mechanical Characteristics of Diamond-Like-Carbon Nanosprings Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
- Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography
- Nanometrology of Si Nanostructures Embedded in SiO2 using Scanning Electron Microscopy
- Carbon Multiprobes with Nanosprings Integrated on Si Cantilever Using Focused-Ion-Beam Technology