A New Approach to Reducing Line-Edge Roughness by Using a Cross-Linked Positive-Tone Resist
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-30
著者
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Nagase Masao
Ntt Basic Research Laboratories
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Nagase M
Ntt Basic Research Laboratories Ntt Corporation
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Yamaguchi Toru
Ntt Basic Research Laboratories Ntt Corporation
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YAMAZAKI Kenji
NTT Basic Research Laboratories
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NAMATSU Hideo
NTT Basic Research Laboratories
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KURIHARA Kenji
NTT Basic Research Laboratories
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KURIHARA Kenji
NTT LSI Laboratories
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Yamazaki K
Ntt Corp. Kanagawa Jpn
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Kajiwara Ken
Plasma Research Center University Of Tsukuba:(present)naka Fusion Research Establishment Japan Atomi
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Kurihara Kazuaki
Plasma Research Center University Of Tsukuba:(present) Japan Atomic Energy Research Institute
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Yamazaki K
Ntt Basic Research Laboratories Ntt Corporation
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Kurihara Kazuaki
Fujitsu Laboratories Inorganic Materials & Polymers Laboratory
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Yamazaki Katsuyuki
The Faculty Of Engineering Tokyo Institute Of Technology : (presently) Canon Inc.
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Namatsu H
Ntt Basic Res. Lab. Kanagawa Jpn
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