YAMAZAKI Kenji | NTT Basic Research Laboratories
スポンサーリンク
概要
関連著者
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YAMAZAKI Kenji
NTT Basic Research Laboratories
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NAMATSU Hideo
NTT Basic Research Laboratories
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Yamazaki K
Ntt Corp. Kanagawa Jpn
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Yamaguchi Toru
Ntt Basic Research Laboratories Ntt Corporation
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Yamazaki K
Ntt Basic Research Laboratories Ntt Corporation
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Namatsu H
Ntt Basic Res. Lab. Kanagawa Jpn
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Nagase Masao
Ntt Basic Research Laboratories
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KURIHARA Kenji
NTT Basic Research Laboratories
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KURIHARA Kenji
NTT LSI Laboratories
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Kajiwara Ken
Plasma Research Center University Of Tsukuba:(present)naka Fusion Research Establishment Japan Atomi
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Kurihara Kazuaki
Plasma Research Center University Of Tsukuba:(present) Japan Atomic Energy Research Institute
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Kurihara Kazuaki
Fujitsu Laboratories Inorganic Materials & Polymers Laboratory
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Yamazaki Katsuyuki
The Faculty Of Engineering Tokyo Institute Of Technology : (presently) Canon Inc.
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Takahashi Y
Ntt Basic Research Laboratories Ntt Cornoration
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TAKAHASHI Yasuo
NTT Basic Research Laboratories, NTT Corporation
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Takahashi Yasuo
Ntt Basic Research Laboratories Ntt Corporation
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Takahashi Y
Hokkaido Univ. Sapporo‐shi Jpn
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Nagase M
Ntt Basic Research Laboratories Ntt Corporation
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Takahashi Yasuo
Faculty Of Pharmaceutical Sciences Tokyo University Of Science
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YAMAGUCHI Hiroshi
NTT Basic Research Laboratories
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Fujiwara Akira
NTT Basic Research Laboratories, NTT Corporation
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Fujiwara A
Ntt Basic Research Laboratories Ntt Corporation
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Fujiwara A
Ntt Corp. Atsugi Jpn
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Fujiwara Akira
Ntt Basic Research Laboratories Ntt Corporation
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Ono Yukinori
NTT Basic Research Laboratories
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Murase Katsumi
Ntt Basic Research Laboratories Ntt Corporation:(present)ntt Electronics Corporation (nel)
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Takahashi Y
Graduate School Of Information Science And Technology Hokkaido Univ.
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Yamazaki Kenji
Ntt Basic Research Laboratories Ntt Corporation
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Yamazaki K
Nippon Motorola Ltd. Tokyo Jpn
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Ono Yukinori
Ntt Basic Research Laboratories Ntt Cornoration
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TAKAHASHI Yasuo
Graduate School of Information Science and Technology, Hokkaido University
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Takahashi Y
Osaka University
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MURASE Katsumi
NTT Basic Research Laboratories, NTT Corporation
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ZIMMERMAN Neil
National Institute of Standards and Technology
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Yamazaki Kenji
Ntt Corp. Kanagawa Jpn
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Takahashi Y
Department Of Applied Physics School Of Engineering Tohoku University
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Takahashi Yasuo
The Tokyo Metropolitan Research Laboratory Of Public Health:graduate School Of Nutritional And Envir
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Ono Yukinori
Ntt Basic Research Laboratories Nippon Telegraph And Telephone Corporation
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OKAMOTO Hajime
NTT Basic Research Laboratories
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NAGASE Maso
NTT Basic Research Laboratories
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MURASE Kastusmi
NTT Basic Research Laboratories
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Takahashi Yasuo
Graduate School Of Information Science And Technology Hokkaido Univ.
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Okamoto Hajime
Ntt Basic Research Laboratories Ntt Corporation
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KANZAKI Kenichi
NTT Basic Research Laboratories, NTT Corporation
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Kohashi Teruo
Joint Research Center For Atom Technology (jrcat)-angstrom Technology Partnership (atp)
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SAIFULLAH Mohammad
NTT Basic Research Laboratories
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Kanzaki Kenichi
Ntt Basic Research Laboratories Nippon Telegraph And Telephone Corporation
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KOIKE Kazuyuki
Central Research Laboratory, Hitachi Ltd.
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Singh Vijay
Ntt Basic Research Laboratories Ntt Corporation
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TAWARA Takehiko
NTT Basic Research Laboratories, NTT Corporation
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Tawara Takehiko
Ntt Basic Research Laboratories Ntt Corporation
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YAMAZAKI Kenji
NTT LSI Laboratories
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Koike Kazuyuki
Central Research Laboratory Hitachi Ltd:joint Research Center For Atom Technology (jrcat) National I
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Koike Kazuyuki
Central Research Laboratory Hitachi Ltd.
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Yamaguchi Hiroshi
Ntt Basic Research Laboratories Nippon Telegraph And Telephone Corp.
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Tawara Takehiko
Ntt Basic Res. Lab. Kanagawa Jpn
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Yamazaki Kenji
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Yamazaki Kenji
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Yamaguchi Toru
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Yamaguchi Toru
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Kohashi Teruo
Joint Research Center for Atom Technology (JRCAT), Angstrom Technology Partnership (ATP), 1-1-1 Higashi, Tsukuba, Ibaraki 305-0046, Japan
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Namatsu Hideo
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Zimmerman Neil
National Institute of Standards and Technology, Gaithersburg, Maryland 20899, U.S.A.
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Nagase Masao
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-01, Japan
著作論文
- Single-Electron Detection in Si-Wire Transistors at Room Temperature
- Si Single-Electron Devices : Recent Attempts towards High Performance and Functionality
- A Si Memory Device Composed of a One-Dimensional Metal-Oxide-Semiconductor Field-Effect-Transistor Switch and a Single-Electron-Transistor Detector
- Sub-10-nm Overlay Accuracy in Electron Beam Lithography for Nanometer-Scale Device Fabrication
- Line-Edge Roughness: Characterization and Material Origin
- Turnstile Operation Using a Silicon Dual-Gate Single-Electron Transistor
- Single-Electron Transistor and Current-Switching Device Fabricated by Vertical Pattern-Dependent Oxidation
- Resist Thinning Effect on Nanometer-Scale Line-Edge Roughness : Instrumentation, Measurement, and Fabrication Technology
- A New Approach to Reducing Line-Edge Roughness by Using a Cross-Linked Positive-Tone Resist
- Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography
- Three-Dimensional Nanofabrication with 10-nm Resolution
- Effect of Chelating Agents on High Resolution Electron Beam Nanolithography of Spin-Coatable Al_2O_3 Gel Films
- Edge-Enhancement Writing for Electron Beam Nanolithography
- Flexible Nanofabrication in Three-Dimensional Electron-Beam Lithography Enhanced by Suppression of Proximity Effect
- Three-Dimensional Resist-Coating Technique and Nanopatterning on a Cube Using Electron-Beam Lithography and Etching
- Fabrication of Nanomechanical Structures from Bulk-GaAs Using Angled Ion Etching
- Eectron-Beam Diameter Measurement Using a Knife Edge with a Visor for Scattering Eectrons
- A Spin-Polarized Scanning Electron Microscope with 5-nm Resolution : Instrumentation, Measurement, and Fabrication Technology
- Resist Coating on Vertical Side Faces Using Conventional Spin Coating for Creating Three-Dimensional Nanostructures in Semiconductors
- Study on High-Resolution and Highly Accurate Electron-Beam Nanolithography(Abstracts of Doctoral Dissertations,Annual Report(from April 2003 to March 2004))
- Turnstile Operation Using a Silicon Dual-Gate Single-Electron Transistor
- Three-Dimensional Nanofabrication with 10-nm Resolution
- Line-Edge Roughness: Characterization and Material Origin
- Modulation of Young's Modulus of Poly(methyl methacrylate) Nanobeam Due to Electron-Beam Exposure
- Electron-Beam Diameter Measurement Using a Knife Edge with a Visor for Scattering Electrons
- Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography