Fabrication of SiO_2/Si/SiO_2 Double Barrier Diodes using Two-Dimensional Si Structures

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-06-01

著者

• Nagase Masao

  Ntt Basic Research Laboratories

• HORIGUCHI Seishi

  Optoelectronics Joint Research Laboratory

• Horiguchi Seiji

  Ntt Basic Research Laboratories

• Horiguchi Seiji

  Ntt Basic Research Laboratories Ntt Corporation

• Nagase M

  Ntt Basic Research Laboratories Ntt Corporation

• Takahashi Y

  Ntt Basic Research Laboratories Ntt Cornoration

• Takahashi Y

  Osaka University

• TAKAHASHI Yasuo

  NTT Basic Research Laboratories, NTT Corporation

• NAMATSU Hideo

  NTT Basic Research Laboratories

• KURIHARA Kenji

  NTT Basic Research Laboratories

• KURIHARA Kenji

  NTT LSI Laboratories

• Kajiwara Ken

  Plasma Research Center University Of Tsukuba:(present)naka Fusion Research Establishment Japan Atomi

• Kurihara Kazuaki

  Plasma Research Center University Of Tsukuba:(present) Japan Atomic Energy Research Institute

• Kurihara Kazuaki

  Fujitsu Laboratories Inorganic Materials & Polymers Laboratory

• Namatsu H

  Ntt Basic Res. Lab. Kanagawa Jpn

• Takahashi Yasuo

  The Tokyo Metropolitan Research Laboratory Of Public Health:graduate School Of Nutritional And Envir

• Takahashi Yasuo

  Faculty Of Pharmaceutical Sciences Tokyo University Of Science

• Takahashi Yasuo

  Ntt Basic Research Laboratories Ntt Corporation

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