Supercritical Improvement of Resist Patterns by Introducing Functional Molecules
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概要
- 論文の詳細を見る
A new performance enhancement technique for resists has been developed that involves the use of supercritical fluid and functional molecules. Because it is an excellent solvent, the supercritical fluid dissolves the molecules, which provide functions originally lacking in the resist material; and the good diffusivity of supercritical fluid distributes the molecules throughout the resist. Thus, functions can be added to a resist without degrading its sensitivity or development characteristics because the process is performed after exposure and development. Furthermore, since the molecules are dispersed uniformly, there is no change in the line width of resist patterns. This advanced technique for improving resists using supercritical fluid has great potential to change the current concept of resist processes.
- Japan Society of Applied Physicsの論文
- 2005-01-10
著者
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Sato Mitsuru
Tokyo Ohka Kogyo Co. Ltd.
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NAMATSU Hideo
NTT Basic Research Laboratories
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Sato Mitsuru
Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Namatsu Hideo
NTT Basic Research Laboratories, NTT Co., 3-1 Morinosato, Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan
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