The Impact of Supercritical Fluoro-Compounds on Lithography Use
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概要
- 論文の詳細を見る
This article describes the use of supercritical fluoro-compounds for supercritical resist drying. In contrast to carbon dioxide, fluoro-compounds, which are heavier than water in liquid form, can displace the rinse water on the resist due to the difference in specific gravity. The removal of rinse water from a sample surface by replacing it with a liquid fluoro-compound, followed by the conversion of the compound to the supercritical state, enables patterns to be formed without collapse and without the use of a surfactant. Furthermore, with the help of helium, which can be released quickly from the chamber, the use of supercritical fluoro-compounds like C2HF5 and SF6 also enable the very fast supercritical resist drying of water-rinsed resists for advanced lithography.
- Japan Society of Applied Physicsの論文
- 2004-04-01
著者
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NAMATSU Hideo
NTT Basic Research Laboratories
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Namatsu Hideo
NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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