Bilayer Resist Method for Room-Temperature Nanoimprint Lithography
スポンサーリンク
概要
- 論文の詳細を見る
A compact nanoimprint lithography (NIL) apparatus using the driving power of a servomotor has been newly developed. A bilayer resist method using hydrogen silsequioxane (HSQ) as a top layer and AZ photoresist as a bottom layer has been proposed to achieve high-aspect resist patterns on a nonflat surface for room-temperature nanoimprint lithography (RT-NIL). The etching rate ratio of HSQ to AZ photoresist was higher than 100 for O2 reactive ion etching (RIE), indicating that the HSQ top layer has sufficient etching tolerance. We have achieved the high-aspect nanostructure patterns of 100-nm-linewidth and 1-μm-height using the NIL apparatus developed here.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-06-15
著者
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OCHIAI Yukinori
NEC Fundamental and Environmental Research Laboratories
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NAMATSU Hideo
NTT Basic Research Laboratories
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NAKAMATSU Ken-ichiro
Graduate School of Science, LASTI, Himeji Institute of Technology
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WATANABE Keiichiro
Graduate School of Science, LASTI, Himeji Institute of Technology
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TONE Katsuhiko
Graduate School of Science, LASTI, Himeji Institute of Technology
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KATASE Tetsuya
Meisyo Co.
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HATTORI Wataru
NEC Fundamental Research Labs
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KOMURO Masanori
Advanced Semiconductor Research Center, AIST
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Sasago Masaru
Matsushita Electric Industrial Co.
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Matsuo Takahiro
Matsushita Electric Industrial Co. Ltd. (panasonic)
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Matsui Shinji
Graduate School Of Science And Laboratory Of Advanced Science And Technology For Industry Himeji Ins
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Sasago Masaru
Matsushita Electric Industrial Co., 19 Kasugacho, Nishikujyo, Minamiku, Kyoto 601-8413, Japan
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Komuro Masanori
Advanced Semiconductor Research Center, AIST, 1-1 Umezono, 1-Chome, Tsukuba, Ibaraki 305-8501, Japan
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Katase Tetsuya
Meisyo Co., 148 Numa, Hikami-cho, Hikami-gun, Hyougo, Japan
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Matsuo Takahiro
Matsushita Electric Industrial Co., 19 Kasugacho, Nishikujyo, Minamiku, Kyoto 601-8413, Japan
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Nakamatsu Ken-ichiro
Graduate School of Science, Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo
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Nakamatsu Ken-ichiro
Graduate School of Science, LASTI, Himeji Institute of Technology, 3-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Watanabe Keiichiro
Graduate School of Science, LASTI, Himeji Institute of Technology, 3-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Hattori Wataru
NEC Fundamental Research Labs, 34 Miyukigaoka, Tsukuba 305-8051, Japan
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