Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
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概要
- 論文の詳細を見る
- 2006-12-25
著者
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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MAEDA Katsumi
Jisso and Production Technologies Research Laboratories, NEC Corporation
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NAKANO Kaichiro
Jisso and Production Technologies Research Laboratories, NEC Corporation
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Maeda Katsumi
Jisso And Production Technologies Research Laboratories Nec Corporation
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