Shirai Masamitsu | Department Of Applied Chemistry Osaka Prefecture University
スポンサーリンク
概要
関連著者
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Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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白井 正充
大阪府立大学大学院工学研究科
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Shirai Masamitsu
Osaka Prefecture Univ. Osaka Jpn
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Okamura Haruyuki
Osaka Prefecture Univ. Osaka Jpn
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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TSUNOOKA Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Tsunooka Masahiro
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Matsuo Takahiro
Matsushita Electric Industrial Co. Ltd. (panasonic)
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Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
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Tsunooka M
Osaka Prefecture Univ. Osaka Jpn
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SUYAMA Kanji
Department of Applied Chemistry, Osaka Prefecture University
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Okamura Haruyuki
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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LALEVEE Jacques
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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ALLONAS Xavier
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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FOUASSIER Jean-Pierre
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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Inoue Tomohiro
Department Of Applied Chemistry Osaka Prefecture University
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SHIN Kazuo
Department of Nuclear Engineering, Kyoto University
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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Kishimura Shinji
Ulsi Laboratory Mitsubishi Electric Corporation:semiconductor Group System Lsi Division
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Shin Kazuo
Department Of Applied Chemistry Osaka Prefecture University
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Sasago Masaru
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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OHBA Tadahiro
Department of Applied Chemistry, Osaka Prefecture University
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NAKAI Daisuke
Department of Applied Chemistry, Osaka Prefecture University
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QU Weihong
Department of Applied Chemistry, Osaka Prefecture University
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Qu Weihong
Department Of Applied Chemistry Osaka Prefecture University
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TACHI Hideki
Department of Applied Chemistry, Osaka Prefecture University
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INOUE Tomohiro
Department of Natural Sciences, Faculty of Science and Engineering, Tokyo Denki University
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Katsuyama Akiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Katsuyama Akiko
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Tachi Hideki
Department Of Applied Chemistry Osaka Prefecture University
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OKAMURA Haruyuki
Department of Applied Chemistry, Osaka Prefecture University
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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Okamura Haruyuki
Department Of Applied Chemistry Osaka Prefecture University
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MATSUKAWA Daisaku
Department of Applied Chemistry, Osaka Prefecture University
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KAWAUE Akiya
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Osaka Prefecture University
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KATOGI Shigeki
R&D Center, Hitachi Chemical Co., Ltd.
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YUSA Masami
R&D Center, Hitachi Chemical Co., Ltd.
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Yusa Masami
R&d Center Hitachi Chemical Co. Ltd.
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Katogi Shigeki
R&d Center Hitachi Chemical Co. Ltd.
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Shirai Masamitsu
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Kawaue Akiya
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Ohba Tadahiro
Osaka Prefecture Univ. Osaka Jpn
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OKAMURA Haruyuki
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
著作論文
- Photocrosslinking and Thermal Degradation of Epoxy-containing Polymers Using Photobase Generators
- Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
- Visible Light-induced Cationic Polymerization of Epoxides Sensitized by Benzoquinonylsulfanyl Derivatives
- Triplet State of O-Acyloximes Studied by Time-Resolved Absorption Spectroscopy
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Cyclic O-Acyloximes as Novel Photolatent Bases
- Enhanced photochemical generation of amines from trifunctional O-acyloxime
- Photocrosslinking System Using Highly-Functionalized Epoxy Crosslinkers Having Degradable Property
- Negative EUV resist based on thiol-ene system
- Non-chemically amplified EUV resist based on PHS
- Preparation of replicated resin mold for UV nanoimprint using reworkable dimethacrylate
- Analysis of chain propagation in UV curing using reworkable resin
- i-Line sensitive photoacid generators using thianthrenium derivatives
- I-line sensitive non-ionic photoacid generators having thianthrene skeleton
- Degradable Network Polymers Based on Di(meth)acrylates
- Highly Sensitive Photocrosslinking System Using Fluorene Derivatives Having Vinyl Ether or Epoxy Moiety
- Multi-Functional Methacrylates Bearing Thermal Degradation Properties--Synthesis, Photo- and Thermal Curing, and Thermolysis
- Photocrosslinkable Polymers with Redissolution Property
- Base Generation by the Photolysis of an Amineimide with Triplet-sensitizers and Its Use for an Epoxide/Thiol Curing System