TSUNOOKA Masahiro | Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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概要
- 同名の論文著者
- Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture Universityの論文著者
関連著者
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TSUNOOKA Masahiro
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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Tsunooka M
Osaka Prefecture Univ. Osaka Jpn
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Matsuo Takahiro
Matsushita Electric Industrial Co. Ltd. (panasonic)
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Tsunooka Masahiro
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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SHIRAI Masamitsu
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Shirai Masamitsu
Department Of Applied Chemistry Osaka Prefecture University
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Sasago M
Matsuisita Electric Industrial Co. Ltd. Kyoto Jpn
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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白井 正充
大阪府立大学大学院工学研究科
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SHIMADA Shingo
Department of Chemistry, Faculty of Science, Kanazawa University
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Shimada S
Nagoya Institute Of Technology
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LALEVEE Jacques
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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ALLONAS Xavier
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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FOUASSIER Jean-Pierre
Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie
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SHIMADA Shozo
SUNFCO, Ltd.
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TABUCHI Kenzo
Department of Industrial Chemistry, Niihama National College of Technology
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ITANI Toshiro
Semiconductor Leading Edge Technolgies, Inc.
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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Kishimura Shinji
Ulsi Laboratory Mitsubishi Electric Corporation:semiconductor Group System Lsi Division
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Sasago Masaru
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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SUYAMA Kanji
Department of Applied Chemistry, Osaka Prefecture University
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SHINOZUKA Toyofumi
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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QU Weihong
Department of Applied Chemistry, Osaka Prefecture University
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Qu Weihong
Department Of Applied Chemistry Osaka Prefecture University
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Suyama Kanji
Department Of Applied Chemistry Osaka Prefecture University
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TACHI Hideki
Department of Applied Chemistry, Osaka Prefecture University
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Katsuyama Akiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Katsuyama Akiko
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Itani Toshiro
Semiconductor Leading Edge Technologies Inc
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Tachi Hideki
Department Of Applied Chemistry Osaka Prefecture University
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Ito Ken-ichi
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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Okamura Haruyuki
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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NISHIMURA Masamichi
Department of Applied Chemistry, Collage of Engineering, University of Osaka Prefecture
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SASHIO Minoru
Department of Applied Chemistry, Collage of Engineering, University of Osaka Prefecture
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KAWAUE Akiya
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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Shirai Masamitsu
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Kawaue Akiya
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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Nishimura Masamichi
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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Sashio Minoru
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
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OKAMURA Haruyuki
Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
著作論文
- Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
- Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
- Visible Light-induced Cationic Polymerization of Epoxides Sensitized by Benzoquinonylsulfanyl Derivatives
- Triplet State of O-Acyloximes Studied by Time-Resolved Absorption Spectroscopy
- Phase-Transfer Photopolymerization of Methyl Methacrylate with Tetrabutylammonium Chloride-KSCN-CCI_4 in an Aqueous-Organic Two-Phase System
- Photopolymerization of Methyl Methacrylate with N-Cetylpyridinium Chloride-KSCN-CCI_4 in Aqueous System
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Photo-Initiated Amine-Formation in a Polymer Matrix and Its Application to Thermal Cross-Linking of Poly(Glycidyl Methacrylate) Films
- Photocrosslinkable Polymers with Redissolution Property