IWASA Shigeyuki | Fundamental and Environmental Research Laboratories, NEC Corporation

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著作論文

Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists
Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)
ArF Chemically Amplified Negative Resists Using Alicyclic Epoxy Polymer
Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193nm Lithography
Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists
Chemically Amplified Negative Resists Based on Alicyclic Acrylate Polymers for 193-nm Lithography
High Power Organic Radical Battery for Information Systems(Electrochemical of Organic Materials)(Recent Progress in Organic Molecular Electronics)
Synthesis and Electrochemical Characterization of a Polyradical Cathode Material for Rechargeable Batteries(Special Issue on Recent Progress in Organic Molecular Electronics)

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