Maeda Ken-ichi | Jisso And Production Technologies Research Laboratories Nec Corporation

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著作論文

ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists
Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)
ArF Chemically Amplified Negative Resists Using Alicyclic Epoxy Polymer
Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193nm Lithography
Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists
An Even Harmonic Quadrature Mixer with a Simple Filter Configuration and an Integrated LTCC Module for W-CDMA Direct Conversion Receiver(Advanced RF Technologies for Compact Wireless Equipment and Mobile Phones)
An Even Harmonic Mixer Using Self-Biased Anti-Parallel Diode Pair(Special Issue on Microwave and Millimeter Wave Technology)
A 2 GH_z-Band Even Harmonic Type SiGe-MMIC Direct Conversion CECCTP Mixer(Special Issue on Silicon RF Device & Integrated Circuit Technologies)
Chemically Amplified Negative Resists Based on Alicyclic Acrylate Polymers for 193-nm Lithography
CD40 and IFN-γ dependent T cell activation by human bronchial epithelial cells

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