ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-12-15
著者
-
MAEDA Katsumi
Functional Devices Research Laboratories, NEC Corporation
-
Nakano K
Jisso And Production Technologies Research Laboratories Nec Corporation
-
IWASA Shigeyuki
Fundamental and Environmental Research Laboratories, NEC Corporation
-
NAKANO Kaichiro
Functional Materials Research Laboratories, NEC Corporation
-
IWASA Shigeyuki
Functional Materials Research Laboratories, NEC Corporation
-
HASEGAWA Etsuo
Functional Materials Research Laboratories, NEC Corporation
-
Maeda Kenichi
Jisso And Production Technologies Research Laboratories Nec Corporation
-
Maeda Katsumi
Functional Devices Research Laboratories Nec Corporation
-
Hasegawa E
Fundamental And Environmental Research Laboratories Nec Corporation
-
Hasegawa Etsuo
Functional Materials Res.labs. Nec Corp.
-
Nakano Kaichiro
Jisso And Production Technologies Research Laboratories Nec Corporation
-
Iwasa Shigeyuki
Fundamental And Environmental Research Laboratories Nec Corporation
-
Maeda Ken-ichi
Jisso And Production Technologies Research Laboratories Nec Corporation
-
Nakano Kaichiro
Functional Materials Research Laboratories Nec Corporation
関連論文
- Chromium Fluoride Attenuated Phase-Shifting Mask for Argon Fluoride Excimer Laser Lithography
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists
- ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
- Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists
- Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)
- ArF Chemically Amplified Negative Resists Using Alicyclic Epoxy Polymer
- Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193nm Lithography
- Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists
- High-Density, High-Bandwidth Connectors for Broad-Band ISDN (Special Issue on Recent Electromechanical Devices)
- An Even Harmonic Quadrature Mixer with a Simple Filter Configuration and an Integrated LTCC Module for W-CDMA Direct Conversion Receiver(Advanced RF Technologies for Compact Wireless Equipment and Mobile Phones)
- An Even Harmonic Mixer Using Self-Biased Anti-Parallel Diode Pair(Special Issue on Microwave and Millimeter Wave Technology)
- A 2 GH_z-Band Even Harmonic Type SiGe-MMIC Direct Conversion CECCTP Mixer(Special Issue on Silicon RF Device & Integrated Circuit Technologies)
- Chemically Amplified Negative Resists Based on Alicyclic Acrylate Polymers for 193-nm Lithography
- CD40 and IFN-γ dependent T cell activation by human bronchial epithelial cells
- High Power Organic Radical Battery for Information Systems(Electrochemical of Organic Materials)(Recent Progress in Organic Molecular Electronics)
- Synthesis and Electrochemical Characterization of a Polyradical Cathode Material for Rechargeable Batteries(Special Issue on Recent Progress in Organic Molecular Electronics)
- A High Capacitive Coupling Ratio (HiCR) Cell for Single 3 Volt Power Supply Flash Memories (Special Section on High Speed and High Density Multi Functional LSI Memories)
- P-30:Fine Patterning of Lateral Three Color Emitters for Organic EL Devices Using a Metal Mask Sliding in Vacuum Vapor Deposition(2-5.ポスタ-セッション)(Society for Information Display 00 Report)
- Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer