Chromium Fluoride Attenuated Phase-Shifting Mask for Argon Fluoride Excimer Laser Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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Seki Yuko
Opto-electronics Research Laboratories
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USHIODA Jun
Opto-Electronics Research Laboratories
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MAEDA Katsumi
Functional Devices Research Laboratories, NEC Corporation
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OHFUJI Takeshi
Functional Devices Research Laboratories, NEC Corporation
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TANABE Hiroyoshi
Opto-Electronics Research Laboratories
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Maeda Katsumi
Functional Devices Research Laboratories Nec Corporation
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Ohfuji T
Functional Devices Research Laboratories Nec Corporation
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Tanabe Hiroyoshi
Opto-electronics Laboratories Nec Corporation
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Ohfuji Takeshi
Functional Devices Research Laboratories Nec Corporation
関連論文
- Chromium Fluoride Attenuated Phase-Shifting Mask for Argon Fluoride Excimer Laser Lithography
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- Monochromatic Projection Optical System for ArF Excimer Laser Lithography
- Polarization Dependence of Electric Field Intensity Distributions in Photoresist Films
- Monolayer Halftone Phase-Shifting Mask for KrF Excimer Laser Lithography
- ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer