ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer

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概要

• 論文の詳細を見る

• We developed alicyclic acrylates with a hydrophilic moiety for use as an ArF chemically amplified positive resist. These monomers have an alicyclic unit, a norbornyl group, and a hydrophilic group, such as a hydroxyl, ester, acetate, or $\gamma$-lactone group. The acrylate polymer having a $\gamma$-lactone unit, 5-acryloyloxy-6-hydroxynorbornane-2-carboxylic 6-lactone, exhibited high thermal stability and high hydrophilicity. A chemically amplified positive resist composed of a terpolymer using the norbornyl acrylate with a lactone structure and a photoacid generator produced a fine resolution of a 0.12 $\mu$m L/S pattern at 16.3 mJ/cm2 by ArF exposure. This resist also produced a contact hole resolution of 0.14 $\mu$m with a depth of focus of 0.5 $\mu$m and exhibited good dry-etching resistance. The oxide etching rate achieved when using the developed resist is 1.29 times that of using a novolac resist, and it produces no resist top roughness after etching.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2001-12-15

著者

• IWASA Shigeyuki

  Functional Materials Research Laboratories, NEC Corporation

• Maeda Katsumi

  Functional Devices Research Laboratories Nec Corporation

• Hasegawa Etsuo

  Functional Materials Res.labs. Nec Corp.

• Nakano Kaichiro

  Functional Materials Research Laboratories Nec Corporation

• Nakano Kaichiro

  Functional Materials Research Laboratories, NEC Corporation, 1-1, Miyazaki 4-chome, Miyamae-ku, Kawasaki 216-8555, Japan

• Hasegawa Etsuo

  Functional Materials Research Laboratories, NEC Corporation, 1-1, Miyazaki 4-chome, Miyamae-ku, Kawasaki 216-8555, Japan

• Maeda Katsumi

  Functional Materials Research Laboratories, NEC Corporation, 1-1, Miyazaki 4-chome, Miyamae-ku, Kawasaki 216-8555, Japan

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• ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer

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