Photoacid and Photobase Generators : Prospects and Their Use in the Development of Polymeric Photosensitive System
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概要
- 論文の詳細を見る
- Chemical Society of Japanの論文
- 1998-11-15
著者
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Shirai Masamitsu
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry College Of Engineering Osaka Prefecture University
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Tsunooka Masahiro
Department Of Applied Chemistry Collage Of Engineering University Of Osaka Prefecture
関連論文
- Photocrosslinking and Thermal Degradation of Epoxy-containing Polymers Using Photobase Generators
- Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology
- Visible Light-induced Cationic Polymerization of Epoxides Sensitized by Benzoquinonylsulfanyl Derivatives
- Triplet State of O-Acyloximes Studied by Time-Resolved Absorption Spectroscopy
- Phase-Transfer Photopolymerization of Methyl Methacrylate with Tetrabutylammonium Chloride-KSCN-CCI_4 in an Aqueous-Organic Two-Phase System
- Photopolymerization of Methyl Methacrylate with N-Cetylpyridinium Chloride-KSCN-CCI_4 in Aqueous System
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Cyclic O-Acyloximes as Novel Photolatent Bases
- Photocrosslinking System Using Highly-Functionalized Epoxy Crosslinkers Having Degradable Property
- Degradable Network Polymers Based on Di(meth)acrylates
- Photo-Initiated Amine-Formation in a Polymer Matrix and Its Application to Thermal Cross-Linking of Poly(Glycidyl Methacrylate) Films
- Photocrosslinkable Polymers with Redissolution Property
- Base Generation by the Photolysis of an Amineimide with Triplet-sensitizers and Its Use for an Epoxide/Thiol Curing System
- Low-$E_{\text{a}}$ Chemical Amplification Resists for 193 nm Lithography
- Photoacid and Photobase Generators : Prospects and Their Use in the Development of Polymeric Photosensitive System
- Synthesis and Properties of Novel i- and g-Line Sensitive Photoacid Generators Based on 9-Fluorenone Derivatives with Aryl-Ethynyl Units
- Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique
- Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- A Reworkable Photothermal Dual-curing System