A Study of Molecular Orientation Effect in Photoresist Films

概要

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The challenge for extreme ultraviolet (EUV) photoresists development is to concurrently meet the resolution, sensitivity and line-width-roughness (LWR) requirements. Understanding the physical and chemical characteristics of the EUV photoresist films is very important. This research has focused on the molecular structure in the photoresist film. Fluorescence spectroscopy has been used to evaluate the molecular structure by the aggregation of the fluorophore of pyrene. The sample was a photoresist based upon an ESCAP-type copolymer of t-butylacrylate and p-hydroxystyrene. The dependence of fluorescence of the spin-coated was measured. As a result, the aggregation or molecular orientation of pyrene molecules in the films was confirmed and its dependence on the solution viscosity was realized, though the polarity around the pyrene in the spin-coated film did not depend on the viscosity. Molecular orientation was formed more easily in the film prepared from the solutions of the higher viscosity by the spin coating. The hydrodynamic forces by the spin-coating may promote the pyrene orientation in the spin-coated film.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2008-06-25