Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Oizumi Hiroaki
Semiconductor Leading Edge Technologies Inc. (selete)
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Itani Toshiro
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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古沢 孝弘
Osaka University
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